Solvent Extraction of Transition Metal Ions with Acyclic Polyethers Incorporating Several Heteroatoms and Bearing Heterocyclic Moieties as End Groups

1995 ◽  
Vol 24 (1) ◽  
pp. 37-38 ◽  
Author(s):  
Hidefumi Sakamoto ◽  
Shigeki Ito ◽  
Makoto Otomo
Keyword(s):  
Solvent Extraction ◽  
Transition Metal ◽  
Metal Ions ◽  
Transition Metal Ions ◽  
End Groups

Highly Selective Solvent Extraction of Copper(II) from Transition Metal Ions with DibutylN,N′-Bis(8-quinolyl)malonamide

1989 ◽  
Vol 18 (11) ◽  
pp. 2073-2076 ◽  
Author(s):  
Kazuhisa Hiratani ◽  
Kazuhiro Taguchi ◽  
Kozaburo Ohhashi ◽  
Hiroshi Nakayama
Keyword(s):  
Solvent Extraction ◽  
Transition Metal ◽  
Metal Ions ◽  
Transition Metal Ions ◽  
Selective Solvent ◽  
Selective Solvent Extraction

HREM Study of electron-induced surface radiation damage in ReO3

1991 ◽  
Vol 49 ◽  
pp. 636-637
Author(s):  
R. Ai ◽  
H.-J. Fan ◽  
L. D. Marks
Keyword(s):  
Transition Metal ◽  
Metal Ions ◽  
Metal Oxides ◽  
Electron Irradiation ◽  
Transition Metal Oxides ◽  
Carbon Film ◽  
Transition Metal Ions ◽  
Surface Radiation ◽  
Valence Transition ◽  
Electron Microscopes

It has been known for a long time that electron irradiation induces damage in maximal valence transition metal oxides such as TiO2, V2O5, and WO3, of which transition metal ions have an empty d-shell. This type of damage is excited by electronic transition and can be explained by the Knoteck-Feibelman mechanism (K-F mechanism). Although the K-F mechanism predicts that no damage should occur in transition metal oxides of which the transition metal ions have a partially filled d-shell, namely submaximal valence transition metal oxides, our recent study on ReO3 shows that submaximal valence transition metal oxides undergo damage during electron irradiation.ReO3 has a nearly cubic structure and contains a single unit in its cell: a = 3.73 Å, and α = 89°34'. TEM specimens were prepared by depositing dry powders onto a holey carbon film supported on a copper grid. Specimens were examined in Hitachi H-9000 and UHV H-9000 electron microscopes both operated at 300 keV accelerating voltage. The electron beam flux was maintained at about 10 A/cm2 during the observation.

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