21120 Plasmon-Assisted Field emitter Array for High Throughput Electron Beam Lithography

2014 ◽  
Vol 2014.20 (0) ◽  
pp. _21120-1_-_21120-2_
Author(s):  
Takahiro OKANO ◽  
Kentaro IWAMI ◽  
Norihiro UMEDA
1997 ◽  
Author(s):  
Heung-Woo Park ◽  
Byeong-Kwon Ju ◽  
Yun-Hi Lee ◽  
In-Byeong Kang ◽  
Noel D. Samaan ◽  
...  

Author(s):  
Hidetaka Shimawaki ◽  
Syunpei Shibuya ◽  
Hidenori Mimura ◽  
Kuniyoshi Yokoo

1998 ◽  
Vol 41-42 ◽  
pp. 453-456 ◽  
Author(s):  
M. Takai ◽  
T. Kishimoto ◽  
H. Morimoto ◽  
Y.K. Park ◽  
S. Lipp ◽  
...  

2000 ◽  
Vol 76 (22) ◽  
pp. 3319-3321 ◽  
Author(s):  
O. Yavas ◽  
C. Ochiai ◽  
M. Takai ◽  
A. Hosono ◽  
S. Okuda

2011 ◽  
Vol 222 ◽  
pp. 209-212
Author(s):  
Yasuo Takagi ◽  
Akifumi Koike ◽  
Takahiro Fujino ◽  
Toru Aoki ◽  
Y. Neo ◽  
...  

To realize a fine focused electron beam less than several ten nm in diameter, the initial emission angle must be narrowed as much as possible. To control the initial emission angle, we have introduced a suppressor gate below the extractor gate electrode. The paper describes the fabrication of the field emitter array with a built-in suppressor gate.


Author(s):  
O. Yavas ◽  
C. Ochiai ◽  
M. Takai ◽  
Y. K. Park ◽  
C. Lehrer ◽  
...  

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