scholarly journals 424 3-dimentional microstructures produced by the combination of high aspect ratio processing using synchrotron radiation and anisotropic etching

2001 ◽  
Vol 2001.9 (0) ◽  
pp. 369-370
Author(s):  
Teppei KIMUURA ◽  
Harutaka MEKARU ◽  
Tadasi HATTORI
Keyword(s):  
Synchrotron Radiation ◽  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Anisotropic Etching

Developing high aspect ratio comb-drive using synchrotron radiation at Indus-2

2013 ◽  
Author(s):  
Rahul Shukla ◽  
V. K. Jain ◽  
V. P. Dhamgaye ◽  
G. S. Lodha
Keyword(s):  
Synchrotron Radiation ◽  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Comb Drive

SYNCHROTRON-RADIATION-SUPPORTED HIGH-ASPECT-RATIO NANOFABRICATION

COSMOS ◽  
2007 ◽  
Vol 03 (01) ◽  
pp. 79-88
Author(s):  
A. CHEN ◽  
G. LIU ◽  
L. K. JIAN ◽  
HERBERT O. MOSER
Keyword(s):  
Synchrotron Radiation ◽  
Aspect Ratio ◽  
Light Source ◽  
Process Parameters ◽  
High Aspect Ratio ◽  
Radiation Spectrum ◽  
Nanometer Scale ◽  
X Ray ◽  
Preliminary Results ◽  
Synchrotron Light

X-ray lithography with synchrotron radiation is an important nanolithographic tool which has unique advantages in the production of high aspect ratio nanostructures. The optimum synchrotron radiation spectrum for nanometer scale X-ray lithography is normally in the range of 500 eV to 2 keV. In this paper, we present the main methods, equipment, process parameters and preliminary results of nanofabrication by proximity X-ray lithography within the nanomanufacturing program pursued by Singapore Synchrotron Light Source (SSLS). Nanostructures with feature sizes down to 200 nm and an aspect ratio up to 10 have been successfully achieved by this approach.

Fabrication of High-Aspect-Ratio Microstructures on Tetraacrylate/Acrylamide Monomers Using Synchrotron Radiation

2019 ◽  
Vol 53 (2) ◽  
pp. 136-142
Author(s):  
D. I. Derevyanko ◽  
N. A. Orlova ◽  
V. V. Shelkovnikov ◽  
I. K. Shundrina ◽  
B. G. Goldenberg ◽  
...  
Keyword(s):  
Synchrotron Radiation ◽  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Acrylamide Monomers

High-aspect ratio microfabrication of crosslinked polytetrafluoroethylene using synchrotron radiation direct photo-etching

2003 ◽  
Author(s):  
Takanori Katoh ◽  
Yasunori Sato ◽  
Daichi Yamaguchi ◽  
Shigetoshi Ikeda ◽  
Yasushi Aoki ◽  
...  
Keyword(s):  
Synchrotron Radiation ◽  
Aspect Ratio ◽  
High Aspect Ratio

High aspect ratio micromachining Teflon by direct exposure to synchrotron radiation

1995 ◽  
Vol 67 (6) ◽  
pp. 872-874 ◽  
Author(s):  
Y. Zhang ◽  
T. Katoh ◽  
M. Washio ◽  
H. Yamada ◽  
S. Hamada
Keyword(s):  
Synchrotron Radiation ◽  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Direct Exposure
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