Fabrication of High-Aspect-Ratio Microstructures on Tetraacrylate/Acrylamide Monomers Using Synchrotron Radiation

2019 ◽  
Vol 53 (2) ◽  
pp. 136-142
Author(s):  
D. I. Derevyanko ◽  
N. A. Orlova ◽  
V. V. Shelkovnikov ◽  
I. K. Shundrina ◽  
B. G. Goldenberg ◽  
...  
2013 ◽  
Author(s):  
Rahul Shukla ◽  
V. K. Jain ◽  
V. P. Dhamgaye ◽  
G. S. Lodha

COSMOS ◽  
2007 ◽  
Vol 03 (01) ◽  
pp. 79-88
Author(s):  
A. CHEN ◽  
G. LIU ◽  
L. K. JIAN ◽  
HERBERT O. MOSER

X-ray lithography with synchrotron radiation is an important nanolithographic tool which has unique advantages in the production of high aspect ratio nanostructures. The optimum synchrotron radiation spectrum for nanometer scale X-ray lithography is normally in the range of 500 eV to 2 keV. In this paper, we present the main methods, equipment, process parameters and preliminary results of nanofabrication by proximity X-ray lithography within the nanomanufacturing program pursued by Singapore Synchrotron Light Source (SSLS). Nanostructures with feature sizes down to 200 nm and an aspect ratio up to 10 have been successfully achieved by this approach.


2003 ◽  
Author(s):  
Takanori Katoh ◽  
Yasunori Sato ◽  
Daichi Yamaguchi ◽  
Shigetoshi Ikeda ◽  
Yasushi Aoki ◽  
...  

1995 ◽  
Vol 67 (6) ◽  
pp. 872-874 ◽  
Author(s):  
Y. Zhang ◽  
T. Katoh ◽  
M. Washio ◽  
H. Yamada ◽  
S. Hamada

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