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High Refractive Index Fluid for Next Generation ArF Immersion Lithography
Journal of Photopolymer Science and Technology
◽
10.2494/photopolymer.19.641
◽
2006
◽
Vol 19
(5)
◽
pp. 641-646
◽
Cited By ~ 2
Author(s):
Taiichi Furukawa
◽
Katsuhiko Hieda
◽
Yong Wang
◽
Takashi Miyamatsu
◽
Kinji Yamada
◽
...
Keyword(s):
Refractive Index
◽
High Refractive Index
◽
Next Generation
◽
Immersion Lithography
Download Full-text
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High refractive index materials design for the next generation ArF immersion lithography
10.1117/12.771122
◽
2008
◽
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◽
Takanori Kishida
◽
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◽
Tsutomu Shimokawa
◽
Zhi Liu
◽
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Keyword(s):
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◽
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◽
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◽
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◽
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High-refractive-index fluids for the next-generation ArF immersion lithography
10.1117/12.656022
◽
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◽
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◽
Takashi Miyamatsu
◽
Taiichi Furukawa
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◽
Tetsuo Tominaga
◽
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◽
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High refractive index fluids for second-generation 193-nm immersion lithography
10.1117/12.711302
◽
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◽
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Akifumi Kagayama
◽
Hiroko Wachi
◽
Yoshimichi Namai
◽
Shin Fukuda
Keyword(s):
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◽
Second Generation
◽
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◽
Immersion Lithography
◽
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High refractive index nanoparticle fluids for 193-nm immersion lithography
10.1117/12.814408
◽
2009
◽
Author(s):
Markos Trikeriotis
◽
Robert Rodriguez
◽
Michael F. Zettel
◽
Aristeidis Bakandritsos
◽
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◽
...
Keyword(s):
Refractive Index
◽
High Refractive Index
◽
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◽
193 Nm
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Prediction of imaging performance of immersion lithography using high refractive index fluid
10.1117/12.772283
◽
2008
◽
Author(s):
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◽
Masamitsu Itoh
◽
Akiko Mimotogi
◽
Shoji Mimotogi
◽
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◽
...
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◽
High Refractive Index
◽
Immersion Lithography
◽
Imaging Performance
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Novel high refractive index fluids for 193nm immersion lithography
10.1117/12.656089
◽
2006
◽
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◽
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◽
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Material design for immersion lithography with high refractive index fluid (HIF)
10.1117/12.599165
◽
2005
◽
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Author(s):
Takashi Miyamatsu
◽
Yong Wang
◽
Motoyuki Shima
◽
Shiro Kusumoto
◽
Takashi Chiba
◽
...
Keyword(s):
Refractive Index
◽
Material Design
◽
High Refractive Index
◽
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High refractive index and high transparency HfO2 nanocomposites for next generation lithography
Journal of Materials Chemistry
◽
10.1039/c0jm00679c
◽
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◽
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◽
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◽
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Woo Jin Bae
◽
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◽
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◽
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◽
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◽
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Keyword(s):
Refractive Index
◽
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◽
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◽
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◽
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A study of 193-nm immersion lithography using novel high refractive index fluids
Microelectronic Engineering
◽
10.1016/j.mee.2005.12.028
◽
2006
◽
Vol 83
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◽
pp. 651-654
◽
Cited By ~ 2
Author(s):
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◽
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◽
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◽
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◽
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◽
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◽
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◽
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◽
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High refractive-index resists composed of anionic photoacid generator (PAG) bound polymers for 193 nm immersion lithography
10.1117/12.770458
◽
2008
◽
Author(s):
Kenneth E. Gonsalves
◽
Mingxing Wang
◽
Narahari S. Pujari
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Refractive Index
◽
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◽
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◽
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