Dissolution Promotion Effect of Addition of Low Molecular Compounds to Positive Tone Chemically Amplified Photoresist System
2017 ◽
Vol 30
(3)
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pp. 281-284
Kazuma Takamori
◽
Takashi Nishiyama
◽
Eriko Sato
◽
Hideo Horibe
1994 ◽
Vol 12
(6)
◽
pp. 3900
◽
Jun-Sung Chun
◽
Hung-Eil Kim
◽
Stanley Barnett
◽
James Shih
Leo L. Linehan
◽
Gary T. Spinillo
◽
Randolph S. Smith
◽
Wayne M. Moreau
◽
Barry C. McCormick
◽
...
Cody M. Berger
◽
Clifford L. Henderson
Dennis Crapse
◽
Warren W. Flack
◽
Ha-Ai Nguyen
◽
Elliott Capsuto
◽
Craig McEwen
Satoshi Kawada
◽
Yukio Tamai
◽
Shunkichi Omae
◽
Tadahiro Ohmi
Charles D. Schaper
◽
Khalid A. El-Awady
◽
Arthur E. Tay
2003 ◽
Vol 16
(3)
◽
pp. 451-454
◽
Youngmin Choi
◽
Sang-Wook Park
◽
Yongil Kim
◽
Haiwon Lee
Hu Li
◽
Jingcheng Liu
◽
Xiangfei Zheng
◽
Changwei Ji
◽
Qidao Mu
◽
...
Will Conley
◽
Gregory Breyta
◽
William R. Brunsvold
◽
Richard A. Di Pietro
◽
Donald C. Hofer
◽
...