Sensitizer for EUV Chemically Amplified Resist: Metal versus Halogen
2019 ◽
Vol 32
(1)
◽
pp. 21-25
Jing Jiang
◽
Gaetano Giordano
◽
Roberto Fallica
◽
Danilo DeSimone
◽
Geert Vandenberghe
Medhat A. Toukhy
◽
Sanjay Malik
◽
Andrew J. Blakeney
◽
Karin R. Schlicht
1991 ◽
Vol 9
(6)
◽
pp. 3380
◽
Zheng Cui
◽
R. A. Moody
◽
Ian M. Loader
◽
John G. Watson
◽
Philip D. Prewett
2000 ◽
Vol 147
(10)
◽
pp. 3833
◽
Chin-Yu Ku
◽
Jia-Min Shieh
◽
Tsann-Bim Chiou
◽
Hwang-Kuen Lin
◽
Tan Fu Lei
1994 ◽
Vol 6
(4)
◽
pp. 481-488
◽
William D. Hinsberg
◽
Scott A. MacDonald
◽
Nicholas J. Clecak
◽
Clinton D. Snyder
2002 ◽
Vol 20
(1)
◽
pp. 164
G. D. Feke
◽
R. D. Grober
◽
G. Pohlers
◽
J. F. Cameron
Michael T. Reilly
◽
Azalia A. Krasnoperova
◽
Quinn J. Leonard
◽
James W. Taylor
◽
Shaowie Pan
Kaichiro Nakano
◽
Katsumi Maeda
◽
Shigeyuki Iwasa
◽
Takeshi Ohfuji
◽
Etsuo Hasegawa
2007 ◽
Vol 25
(6)
◽
pp. 2114
◽
Yuusuke Tanaka
◽
Yukiko Kikuchi
◽
DooHoon Goo
◽
Hiroaki Oizumi
◽
Iwao Nishiyama