Principal and Error Analysis on Measurement of Multiple-Surface Interference with Wavelength-Tuning Phase-Shifting

2013 ◽  
Vol 40 (10) ◽  
pp. 1008007 ◽  
Author(s):  
刘勇 Liu Yong ◽  
刘旭 Liu Xu ◽  
任寰 Ren Huan ◽  
姜宏振 Jiang Hongzhen ◽  
杨一 Yang Yi ◽  
...  
Keyword(s):  
Error Analysis ◽  
Phase Shifting ◽  
Wavelength Tuning

Error Analysis in a Device to Test Optical Systems by Using Ronchi Test and Phase Shifting

2008 ◽  
Author(s):  
Brasilia Cabrera-Pérez ◽  
Jorge Castro-Ramos ◽  
Gabriel Gordiano-Alvarado ◽  
Sergio Vázquez y Montiel ◽  
Niklaus Ursus Wetter ◽  
...  
Keyword(s):  
Error Analysis ◽  
Phase Shifting ◽  
Optical Systems

Linear error analysis of differential phase shifting algorithms

Optik ◽  
2013 ◽  
Vol 124 (8) ◽  
pp. 710-717 ◽  
Author(s):  
M. Miranda ◽  
B.V. Dorrío ◽  
J. Blanco ◽  
J. Diz-Bugarin
Keyword(s):  
Error Analysis ◽  
Phase Shifting ◽  
Differential Phase

scholarly journals Precise Measurement of the Surface Shape of Silicon Wafer by Using a New Phase-Shifting Algorithm and Wavelength-Tuning Interferometer

2020 ◽  
Vol 10 (9) ◽  
pp. 3250
Author(s):  
Fuqing Miao ◽  
Seokyoung Ahn ◽  
Yangjin Kim
Keyword(s):  
Silicon Wafer ◽  
Phase Error ◽  
Surface Profile ◽  
Phase Shifting ◽  
Wavelength Tuning ◽  
Surface Shape ◽  
Window Function ◽  
Phase Shift Error ◽  
Coupling Error ◽  
New Phase

In wavelength-tuning interferometry, the surface profile of the optical component is a key evaluation index. However, the systematic errors caused by the coupling error between the higher harmonics and phase shift error are considerable. In this research, a new 10N − 9 phase-shifting algorithm comprising a new polynomial window function and a DFT is developed. A new polynomial window function is developed based on characteristic polynomial theory. The characteristic of the new 10N − 9 algorithm is represented in the frequency domain by Fourier description. The phase error of the new algorithm is also discussed and compared with other phase-shifting algorithms. The surface profile of a silicon wafer was measured by using the 10N − 9 algorithm and a wavelength-tuning interferometer. The repeatability measurement error across 20 experiments was 2.045 nm, which indicates that the new 10N − 9 algorithm outperforms the conventional phase-shifting algorithm.

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