Influence of Ion Nitriding Regimes on Diffusion Processes in Titanium Alloy Ti-6Al-4V

The paper reports on the results of two-stage-experiments of low-temperature ion nitriding of the Ti-6Al-4V titanium alloy in a non-self-sustained high-current arc discharge and in a glow discharge under various conditions. The diffusion of nitrogen into the interior of the material was determined by the thickness of the layer being modified. It was established that the depth of the nitrided layer greatly depends on temperature, composition of the working medium, as well as on process duration. When treated in non-self-sustained high-current arc discharge, the depth of the nitrided layer increases from 4 to 17 μm, and in the glowing discharge the depth increases from 9 to 13 μm. The nitriding temperature affects the sign and magnitude of the residual stresses.