Photo-EPR Studies on Low-Energy Electron-Irradiated 4H-SiC

2009 ◽  
Vol 615-617 ◽  
pp. 401-404
Author(s):  
Patrick Carlsson ◽  
Nguyen Tien Son ◽  
Henrik Pedersen ◽  
Junichi Isoya ◽  
Norio Morishita ◽  
...  

Photoexcitation electron paramagnetic resonance (photo-EPR) was used to determine deep levels related to the carbon vacancy (VC) in 4H-SiC. High-purity free-standing n-type 4H-SiC epilayers with concentration of intrinsic defects (except the photo-insensitive SI1 center) below the detection limit of EPR were irradiated with low-energy (200 keV) electrons to create mainly VC and defects related to the C sublattice. The simultaneous observation of and signals, their relative intensity changes and the absence of other defects in the sample provide a more straight and reliable interpretation of the photo-EPR results. The study suggests that the (+|0) level of VC is located at ~EC–1.77 eV in agreement with previously reported results and its single and double acceptor levels may be at ~ EC–0.8 eV and ~ EC–1.0 eV, respectively.

2006 ◽  
Vol 527-529 ◽  
pp. 571-574 ◽  
Author(s):  
X. Kerbiriou ◽  
Marie France Barthe ◽  
S. Esnouf ◽  
P. Desgardin ◽  
G. Blondiaux ◽  
...  

In this work we used Positron Annihilation Spectroscopy (PAS) and Electron Paramagnetic Resonance (EPR) to investigate the properties of vacancy defects produced by low energy electron irradiation. N-doped 3C-SiC and 6H-SiC monocrystals have been irradiated with electrons at different energies from 240keV to 900keV. EPR measurements show that Frenkel pairs VSi 3-/Si are created in 6H-SiC when electron irradiation is performed at low energy (240-360 keV). EPR also indicates that the silicon displacement threshold energy is higher in 3C-SiC than in 6HSiC. Moreover, PAS results show that the size and concentration of the vacancy defects decrease when the electron energy decreases for both polytypes. PAS detects vacancy defects in 240keV electron irradiated 3C-SiC, and the detection of the carbon vacancy is proposed.


2006 ◽  
Vol 527-529 ◽  
pp. 477-480
Author(s):  
W. Sullivan ◽  
John W. Steeds ◽  
Hans Jürgen von Bardeleben ◽  
J.L. Cantin

Several 4H SiC samples have been electron-irradiated at near threshold energies at low fluence, either along the [0001] or [000-1] direction. PL and EPR techniques have been used to investigate the dependence of the beam direction on defect generation and, together with a sample irradiated at a higher fluence, to correlate differences brought about by irradiating with a change in electron fluence. Attempts are made to correlate the information derived from the two techniques.


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