RF and Microwave Afterglows in N2 Gas Mixtures for Surface Nitriding of TiO2 Films
1999 ◽
Vol 116-119
◽
pp. 933-937
◽
Keyword(s):
1916 ◽
Vol 81
(2101supp)
◽
pp. 227-227
Keyword(s):
1972 ◽
Vol 33
(C1)
◽
pp. C1-51-C1-56
◽
2014 ◽
Vol 1
(1)
◽
pp. 7-25
◽
2013 ◽
Vol E96.C
(3)
◽
pp. 385-388
◽
High Temperature Material Processes An International Quarterly of High-Technology Plasma Processes
◽
2020 ◽
Vol 24
(3)
◽
pp. 173-182