2009 17th International Conference on Advanced Thermal Processing of Semiconductors
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36

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3

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Published By IEEE

9781424438143

Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Diffusion and activation of Boron and Phosphorus in preamorphized and crystalline Germanium using ultra fast spike anneal

2009 17th International Conference on Advanced Thermal Processing of Semiconductors ◽

10.1109/rtp.2009.5373459 ◽

2009 ◽

Author(s):

V. Mazzocchi ◽

X. Pages ◽

M. Py ◽

J P Barnes ◽

K. Vanormelingen ◽

...

Keyword(s):

Spike Anneal ◽

Crystalline Germanium

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22nm node p+ junction scaling using B36H44 and laser annealing with or W/O PAI

2009 17th International Conference on Advanced Thermal Processing of Semiconductors ◽

10.1109/rtp.2009.5373435 ◽

2009 ◽

Author(s):

John Borland ◽

Masayasu Tanjyo ◽

Nariaki Hamamoto ◽

Tsutomu Nagayama ◽

Shankar Muthukrishnan ◽

...

Keyword(s):

Laser Annealing

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Heating and photoionization of silicon structures at laser treatments

2009 17th International Conference on Advanced Thermal Processing of Semiconductors ◽

10.1109/rtp.2009.5373466 ◽

2009 ◽

Author(s):

R.M. Bayazitov

Keyword(s):

Laser Treatments ◽

Silicon Structures

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Microwave permittivity of As and B implanted and annealed silicon

2009 17th International Conference on Advanced Thermal Processing of Semiconductors ◽

10.1109/rtp.2009.5373431 ◽

2009 ◽

Author(s):

B. Lojek ◽

H. Song ◽

T. Mulcahy

Keyword(s):

Microwave Permittivity

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Damage evolution in implanted silicon by pulsed excimer laser annealing

2009 17th International Conference on Advanced Thermal Processing of Semiconductors ◽

10.1109/rtp.2009.5373425 ◽

2009 ◽

Author(s):

G. Fisicaro ◽

A. La Magna ◽

G. Piccitto ◽

V. Privitera ◽

K. Huet ◽

...

Keyword(s):

Excimer Laser ◽

Damage Evolution ◽

Laser Annealing ◽

Excimer Laser Annealing

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Copyright page

2009 17th International Conference on Advanced Thermal Processing of Semiconductors ◽

10.1109/rtp.2009.5373478 ◽

2009 ◽

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RTP conference achievement awards

2009 17th International Conference on Advanced Thermal Processing of Semiconductors ◽

10.1109/rtp.2009.5373480 ◽

2009 ◽

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The effect of die-level stress variations on device performance

2009 17th International Conference on Advanced Thermal Processing of Semiconductors ◽

10.1109/rtp.2009.5373427 ◽

2009 ◽

Author(s):

David M. Owen ◽

Christian Otten ◽

Haowen Bu ◽

Yun Wang ◽

Shrinivas Shetty ◽

...

Keyword(s):

Device Performance ◽

Stress Variations

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Improvement of pattern effect by optical-absorption carbon film and flexibly-shaped-pulse flash lamp annealing

2009 17th International Conference on Advanced Thermal Processing of Semiconductors ◽

10.1109/rtp.2009.5373451 ◽

2009 ◽

Author(s):

Shinichi Kato ◽

Takayuki Aoyama ◽

Takashi Onizawa ◽

Kazuto Ikeda ◽

Yuzuru Ohji

Keyword(s):

Optical Absorption ◽

Carbon Film ◽

Pattern Effect ◽

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Millisecond annealing of high-performance SiGe HBTs

2009 17th International Conference on Advanced Thermal Processing of Semiconductors ◽

10.1109/rtp.2009.5373483 ◽

2009 ◽

Author(s):

D. Bolze ◽

B. Heinemann ◽

J. Gelpey ◽

S. McCoy ◽

W. Lerch

Keyword(s):

High Performance

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