ACS Symposium Series - Polymers for Microelectronics
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0841227217, 0841213933
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Chemically Amplified Deep-UV Photoresists Based on Acetal-Protected Poly(vinylphenols)

1993 ◽  
pp. 40-52 ◽  
Author(s):  
Ying Jiang ◽  
David R. Bassett
Keyword(s):  
Chemically Amplified ◽  
Deep Uv

Synthesis of 4-(tert-Butoxycarbonyl)-2,6-dinitrobenzyl Tosylate

1993 ◽  
pp. 25-39
Author(s):  
F. M. Houlihan ◽  
E. Chin ◽  
O. Nalamasu ◽  
J. M. Kometani

scholarly journals Chemical Amplification Mechanisms for Microlithography

1993 ◽  
pp. 2-24 ◽  
Author(s):  
E. Reichmanis ◽  
F. M. Houlihan ◽  
O. Nalamasu ◽  
T. X. Neenan
Keyword(s):  
Chemical Amplification

Acid-Sensitive Pyrimidine Polymers for Chemical Amplification Resists

1993 ◽  
pp. 142-164 ◽  
Author(s):  
Yoshiaki Inaki ◽  
Nobuo Matsumura ◽  
Kiichi Takemoto
Keyword(s):  
Chemical Amplification

scholarly journals Subject Index

1993 ◽  
pp. 558-571

Top-Surface Imaging Using Selective Electroless Metallization of Patterned Monolayer Films

1993 ◽  
pp. 210-219 ◽  
Author(s):  
J. M. Calvert ◽  
W. J. Dressick ◽  
C. S. Dulcey ◽  
M. S. Chen ◽  
J. H. Georger ◽  
...  
Keyword(s):  
Surface Imaging ◽  
Monolayer Films ◽  
Electroless Metallization ◽  
Top Surface Imaging

An Alkaline-Developable Positive Resist Based on Silylated Polyhydroxystyrene for KrF Excimer Laser Lithography

1993 ◽  
pp. 88-100
Author(s):  
Eiichi Kobayashi ◽  
Makoto Murata ◽  
Mikio Yamachika ◽  
Yasutaka Kobayashi ◽  
Yoshiji Yumoto ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Laser Lithography ◽  
Krf Excimer Laser ◽  
Positive Resist

Charged Species in σ-Conjugated Polysilanes as Studied by Absorption Spectroscopy with Low-Temperature Matrices

1993 ◽  
pp. 323-332
Author(s):  
K. Ushida ◽  
A. Kira ◽  
S. Tagawa ◽  
Y. Yoshida ◽  
H. Shibata
Keyword(s):  
Low Temperature ◽  
Absorption Spectroscopy ◽  
Charged Species

Langmuir—Blodgett Deposition To Evaluate Dissolution Behavior of Multicomponent Resists

1993 ◽  
pp. 220-234
Author(s):  
V. Rao ◽  
W. D. Hinsberg ◽  
C. W. Frank ◽  
R. F. W. Pease
Keyword(s):  
Dissolution Behavior ◽  
Langmuir Blodgett
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