ScienceGate
Advanced Search
Author Search
Journal Finder
Blog
Sign in / Sign up
ScienceGate
Search
Author Search
Journal Finder
Blog
Sign in / Sign up
34th European Mask and Lithography Conference
Latest Publications
TOTAL DOCUMENTS
29
(FIVE YEARS 0)
H-INDEX
2
(FIVE YEARS 0)
Published By SPIE
9781510621213, 9781510621220
Latest Documents
Most Cited Documents
Contributed Authors
Related Sources
Related Keywords
Latest Documents
Most Cited Documents
Contributed Authors
Related Sources
Related Keywords
Front Matter: Volume 10775
34th European Mask and Lithography Conference
◽
10.1117/12.2513695
◽
2018
◽
Keyword(s):
Matter Volume
Download Full-text
Fabrication of nanoparticles for biosensing using UV-NIL and lift-off
34th European Mask and Lithography Conference
◽
10.1117/12.2323700
◽
2018
◽
Cited By ~ 1
Author(s):
Tina Mitteramskogler
◽
Hubert Brueckl
◽
Astrit Shoshi
◽
Stefan Schrittwieser
◽
Joerg Schotter
◽
...
Keyword(s):
Lift Off
Download Full-text
Application of rules-based corrections for wafer scale nanoimprint processes and evaluation of predictive models
34th European Mask and Lithography Conference
◽
10.1117/12.2326106
◽
2018
◽
Author(s):
Hubert Teyssedre
◽
Patrick Quemere
◽
Jacky Chartoire
◽
Loïc Perraud
◽
Florian Delachat
◽
...
Keyword(s):
Predictive Models
◽
Wafer Scale
Download Full-text
Alternative absorber materials for mitigation of mask 3D effects in high NA EUV lithography
34th European Mask and Lithography Conference
◽
10.1117/12.2326805
◽
2018
◽
Author(s):
Claire van Lare
◽
Frank Timmermans
◽
Jo Finders
◽
John McNamara
◽
Eelco van Setten
Keyword(s):
Euv Lithography
◽
3D Effects
Download Full-text
Fast local registration measurements for efficient e-beam writer qualification and correction
34th European Mask and Lithography Conference
◽
10.1117/12.2325627
◽
2018
◽
Cited By ~ 2
Author(s):
Klaus-Dieter Roeth
◽
Hendrik Steigerwald
◽
Runyuan Han
◽
Oliver Ache
◽
Frank Laske
Download Full-text
Research on data augmentation for lithography hotspot detection using deep learning
34th European Mask and Lithography Conference
◽
10.1117/12.2326563
◽
2018
◽
Cited By ~ 1
Author(s):
Vadim Borisov
◽
Jürgen Scheible
Keyword(s):
Deep Learning
◽
Data Augmentation
◽
Hotspot Detection
Download Full-text
Manufacturing of roughness standard samples based on ACF/PSD model programming
34th European Mask and Lithography Conference
◽
10.1117/12.2327095
◽
2018
◽
Author(s):
Jérôme Reche
◽
Maxime Besacier
◽
Patrice Gergaud
◽
Yoann Blancquaert
Keyword(s):
Standard Samples
Download Full-text
Measuring inter-layer edge placement error with SEM contours
34th European Mask and Lithography Conference
◽
10.1117/12.2326529
◽
2018
◽
Author(s):
François Weisbuch
◽
Jirka Schatz
◽
Matthias Ruhm
Download Full-text
Lithography technology and trends for More than Moore devices: advanced packaging and MEMS devices
34th European Mask and Lithography Conference
◽
10.1117/12.2326784
◽
2018
◽
Author(s):
Amandine Pizzagalli
Keyword(s):
Mems Devices
◽
Advanced Packaging
◽
Lithography Technology
Download Full-text
On the road to automated production workflows in the back end of line
34th European Mask and Lithography Conference
◽
10.1117/12.2326908
◽
2018
◽
Author(s):
Gilles Tabbone
◽
Kokila Egodage
◽
Kristian Schulz
◽
Anthony Garetto
Keyword(s):
Automated Production
◽
The Road
◽
On The Road
Download Full-text
Load More ...
Sign in / Sign up
Close
Export Citation Format
Close
Share Document
Close