lithography technology Recently Published Documents

Oriented Approach ◽

Color computational holographic display based on laser direct writing lithography technology

10.1117/12.2606842 ◽

2021 ◽

Author(s):

Chuan Shen ◽

ShiQi Lv ◽

JiaQi Fang ◽

JiaLi Sun ◽

YiFei Qi ◽

...

Keyword(s):

Direct Writing ◽

Laser Direct Writing ◽

Holographic Display ◽

Editorial for Special Issue: Nanoimprint Lithography Technology and Applications

Nanomaterials ◽

10.3390/nano11092413 ◽

2021 ◽

Vol 11 (9) ◽

pp. 2413

Author(s):

Michael Muehlberger

Keyword(s):

Nanoimprint Lithography ◽

Special Issue ◽

Nanoimprint Lithography (NIL) has been an interesting and growing field over the last years since its beginnings in the mid 1990ies [...]

Inverse lithography technology: 30 years from concept to practical, full-chip reality

Journal of Micro/Nanopatterning, Materials, and Metrology ◽

10.1117/1.jmm.20.3.030901 ◽

2021 ◽

Vol 20 (03) ◽

Author(s):

Linyong (Leo) Pang

Keyword(s):

Extremely Large Exposure Field With Fine Resolution Lithography Technology To Enable Next Generation Panel Level Advanced Packaging

2021 IEEE 71st Electronic Components and Technology Conference (ECTC) ◽

10.1109/ectc32696.2021.00179 ◽

2021 ◽

Author(s):

John Chang ◽

Timothy Chang ◽

Casey Donaher ◽

Perry Banks ◽

Aries Peng

Keyword(s):

Next Generation ◽

Exposure Field ◽

Advanced Packaging ◽

Fine Resolution ◽

The application of a new stochastic search algorithm “Adam” in inverse lithography technology (ILT) in critical recording head fabrication process

Optical Microlithography XXXIV ◽

10.1117/12.2583508 ◽

2021 ◽

Author(s):

Dan Yu ◽

Yi Liu ◽

Chuck Hawkinson

Keyword(s):

Search Algorithm ◽

Stochastic Search ◽

Fabrication Process ◽

Recording Head ◽

Stochastic Search Algorithm ◽

Advances in Experimental Medicine and Biology - Nanotechnology for Bioapplications ◽

Lithography Technology for Micro- and Nanofabrication

10.1007/978-981-33-6158-4_9 ◽

2021 ◽

pp. 217-233

Author(s):

Dahee Baek ◽

Sang Hun Lee ◽

Bong-Hyun Jun ◽

Seung Hwan Lee

Keyword(s):

Nano-Patterns of Photoresist Fabricated by Ultraviolet Lithography Technology

Journal of Nanoscience and Nanotechnology ◽

10.1166/jnn.2020.17208 ◽

2020 ◽

Vol 20 (4) ◽

pp. 2508-2513

Author(s):

E. Cheng ◽

Suzhou Tang ◽

Chen Li ◽

Helin Zou ◽

Qiang Wei

Keyword(s):

Ultraviolet Lithography ◽

Advanced memory cell design optimization with inverse lithography technology

Design-Process-Technology Co-optimization for Manufacturability XIV ◽

10.1117/12.2557847 ◽

2020 ◽

Author(s):

Jiro Higuchi ◽

Weiting Wang ◽

Takamasa Takaki ◽

Hiromitsu Mashita ◽

Shigeki Nojima ◽

...

Keyword(s):

Design Optimization ◽

Memory Cell ◽

Cell Design ◽

Inverse Lithography Technology (ILT) Enabled Source Mask Optimization (SMO)

ECS Transactions ◽

10.1149/1.3096466 ◽

2019 ◽

Vol 18 (1) ◽

pp. 299-314 ◽

Cited By ~ 2

Author(s):

Linyong Pang ◽

Guangming Xiao ◽

Vikram Tolani ◽

Peter Hu ◽

Tom Cecil ◽

...

Keyword(s):