2018 29th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
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9781538637487
Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Rapid yield ramp using closed loop DFM and overlay process window qualification flow

2018 ◽  
Author(s):  
Michael Wojtowecz ◽  
Deborah Ryan ◽  
Karthik Krishnamoorthy ◽  
Nabil Azad ◽  
Haizhou Yin ◽  
...  
Keyword(s):  
Closed Loop ◽  
Process Window

Defect learning methodology applied to microbump process at 20μm pitch and below

2018 ◽  
Author(s):  
M. Liebens ◽  
J. Slabbekoorn ◽  
A. Miller ◽  
E. Beyne ◽  
M. Stoerring ◽  
...  

CD-TEM: Characterizing impact of TEM sample preparation on CD metrology

2018 ◽  
Author(s):  
Anne Kenslea ◽  
Chris Hakala ◽  
Zhenxin Zhong ◽  
Yinggang Lu ◽  
John Fretwell ◽  
...  
Keyword(s):  
Sample Preparation

Impact of scribe line (kerf) defectivity on wafer yield

2018 ◽  
Author(s):  
Fauzia Khatkhatay ◽  
Ludmila Popova ◽  
Chih-Chieh Huang ◽  
Hye Jin Lee ◽  
Yining Zang ◽  
...  

A novel approach to tool monitoring for furnace tools with dynamic recipe management

2018 ◽  
Author(s):  
Shiladitya Chakravorty ◽  
Chihyun Jung ◽  
Garrett Szafman ◽  
Jaana Rajachidambaram ◽  
Bradley Savoy ◽  
...  
Keyword(s):  
Novel Approach ◽  
Tool Monitoring

Study of titanium nitride underlayer properties and its influence on tungsten growth

2018 ◽  
Author(s):  
Shanti Pancharatnam ◽  
Jean Wynne ◽  
Gauri Karve ◽  
Adra V. Carr ◽  
Brock Mendoza ◽  
...  
Keyword(s):  
Titanium Nitride
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