2020 International Symposium on Semiconductor Manufacturing (ISSM)
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44

(FIVE YEARS 44)

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Published By IEEE

9781665403641

Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Using Quartz Crystal Microbalance to Provide Real-Time Process Monitoring

2020 International Symposium on Semiconductor Manufacturing (ISSM) ◽

10.1109/issm51728.2020.9377515 ◽

2020 ◽

Author(s):

Hirofumi Tsuchiyama ◽

Steven Lakeman

Keyword(s):

Real Time ◽

Quartz Crystal Microbalance ◽

Process Monitoring ◽

Quartz Crystal ◽

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Seasoning Optimization by Using Optical Emission Spectroscopy

2020 International Symposium on Semiconductor Manufacturing (ISSM) ◽

10.1109/issm51728.2020.9377498 ◽

2020 ◽

Author(s):

Masahiro Shiga ◽

Haruki Omine ◽

Masaki Kitsunezuka ◽

Hironori Moki ◽

Yuki Kataoka ◽

...

Keyword(s):

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Optical Emission

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A Statistical Study on Highly Accurate Quality Prediction for High-mix Low-Volume Semiconductor Products

2020 International Symposium on Semiconductor Manufacturing (ISSM) ◽

10.1109/issm51728.2020.9377513 ◽

2020 ◽

Author(s):

Kosuke Okusa ◽

Toshiya Okazaki ◽

Shunsaku Yasuda

Keyword(s):

Statistical Study ◽

Quality Prediction ◽

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The Benefits of Real-time Cloud Analytics in Semiconductor

2020 International Symposium on Semiconductor Manufacturing (ISSM) ◽

10.1109/issm51728.2020.9377535 ◽

2020 ◽

Author(s):

Gabe Villareal ◽

Joe Lee

Keyword(s):

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Planned Maintenance Schedule Update Method for Predictive Maintenance of Semiconductor Plasma Etcher

2020 International Symposium on Semiconductor Manufacturing (ISSM) ◽

10.1109/issm51728.2020.9377534 ◽

2020 ◽

Author(s):

Shota Umeda ◽

Kenji Tamaki ◽

Masahiro Sumiya ◽

Yoshito Kamaji

Keyword(s):

Predictive Maintenance ◽

Semiconductor Plasma ◽

Maintenance Schedule

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Feature Extraction from Equipment Sensor Signals with Time Series Clustering and Its Application to Defect Prediction

2020 International Symposium on Semiconductor Manufacturing (ISSM) ◽

10.1109/issm51728.2020.9377525 ◽

2020 ◽

Author(s):

Daisuke Hamaguchi ◽

Tomonari Masada ◽

Takumi Eguchi

Keyword(s):

Time Series ◽

Feature Extraction ◽

Defect Prediction ◽

Time Series Clustering ◽

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Chamber and Recipe- Independent FDC indicator in High - mix Semiconductor Manufacturing

2020 International Symposium on Semiconductor Manufacturing (ISSM) ◽

10.1109/issm51728.2020.9377516 ◽

2020 ◽

Author(s):

Satoshi Yasuda ◽

Tomoya Tanaka ◽

Masaki Kitabata ◽

Yuko Jisaki

Keyword(s):

Semiconductor Manufacturing

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AI-FDC: Automated Top Down System for Fab Wide Process Equipment Health Monitoring

2020 International Symposium on Semiconductor Manufacturing (ISSM) ◽

10.1109/issm51728.2020.9377500 ◽

2020 ◽

Author(s):

Richard Burch ◽

Michael Keleher ◽

Kazuki Kunitoshi

Keyword(s):

Health Monitoring ◽

Process Equipment ◽

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Process Optimization of Trench Field Plate Power MOSFETs with Sequential Phosphorus-Doped Silicon

2020 International Symposium on Semiconductor Manufacturing (ISSM) ◽

10.1109/issm51728.2020.9377528 ◽

2020 ◽

Author(s):

Kota Tomita ◽

Tatsuya Shiraishi ◽

Hiroaki Kato ◽

Hiroyuki Kishimoto ◽

Katsura Miyashita ◽

...

Keyword(s):

Process Optimization ◽

Power Mosfets ◽

Field Plate ◽

Doped Silicon ◽

Phosphorus Doped

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Minimization of CNN Training Data by using Data Augmentation for Inline Defect Classification

2020 International Symposium on Semiconductor Manufacturing (ISSM) ◽

10.1109/issm51728.2020.9377504 ◽

2020 ◽

Author(s):

Akihiro Fujishiro ◽

Yoshikazu Nagamura ◽

Tatsuya Usami ◽

Masao Inoue

Keyword(s):

Data Augmentation ◽

Training Data ◽

Defect Classification ◽

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