2020 International Symposium on Semiconductor Manufacturing (ISSM)
Latest Publications

TOTAL DOCUMENTS

(FIVE YEARS 44)

H-INDEX

(FIVE YEARS 0)

Published By IEEE

9781665403641

Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Using Quartz Crystal Microbalance to Provide Real-Time Process Monitoring

2020 International Symposium on Semiconductor Manufacturing (ISSM) ◽

10.1109/issm51728.2020.9377515 ◽

2020 ◽

Author(s):

Hirofumi Tsuchiyama ◽

Steven Lakeman

Keyword(s):

Real Time ◽

Quartz Crystal Microbalance ◽

Process Monitoring ◽

Quartz Crystal ◽

Time Process

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Seasoning Optimization by Using Optical Emission Spectroscopy

2020 International Symposium on Semiconductor Manufacturing (ISSM) ◽

10.1109/issm51728.2020.9377498 ◽

2020 ◽

Author(s):

Masahiro Shiga ◽

Haruki Omine ◽

Masaki Kitsunezuka ◽

Hironori Moki ◽

Yuki Kataoka ◽

...

Keyword(s):

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Optical Emission

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A Statistical Study on Highly Accurate Quality Prediction for High-mix Low-Volume Semiconductor Products

2020 International Symposium on Semiconductor Manufacturing (ISSM) ◽

10.1109/issm51728.2020.9377513 ◽

2020 ◽

Author(s):

Kosuke Okusa ◽

Toshiya Okazaki ◽

Shunsaku Yasuda

Keyword(s):

Statistical Study ◽

Quality Prediction ◽

Low Volume

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The Benefits of Real-time Cloud Analytics in Semiconductor

2020 International Symposium on Semiconductor Manufacturing (ISSM) ◽

10.1109/issm51728.2020.9377535 ◽

2020 ◽

Author(s):

Gabe Villareal ◽

Joe Lee

Keyword(s):

Real Time

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Planned Maintenance Schedule Update Method for Predictive Maintenance of Semiconductor Plasma Etcher

2020 International Symposium on Semiconductor Manufacturing (ISSM) ◽

10.1109/issm51728.2020.9377534 ◽

2020 ◽

Author(s):

Shota Umeda ◽

Kenji Tamaki ◽

Masahiro Sumiya ◽

Yoshito Kamaji

Keyword(s):

Predictive Maintenance ◽

Semiconductor Plasma ◽

Maintenance Schedule

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Feature Extraction from Equipment Sensor Signals with Time Series Clustering and Its Application to Defect Prediction

2020 International Symposium on Semiconductor Manufacturing (ISSM) ◽

10.1109/issm51728.2020.9377525 ◽

2020 ◽

Author(s):

Daisuke Hamaguchi ◽

Tomonari Masada ◽

Takumi Eguchi

Keyword(s):

Time Series ◽

Feature Extraction ◽

Defect Prediction ◽

Time Series Clustering ◽

Sensor Signals

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Chamber and Recipe- Independent FDC indicator in High - mix Semiconductor Manufacturing

2020 International Symposium on Semiconductor Manufacturing (ISSM) ◽

10.1109/issm51728.2020.9377516 ◽

2020 ◽

Author(s):

Satoshi Yasuda ◽

Tomoya Tanaka ◽

Masaki Kitabata ◽

Yuko Jisaki

Keyword(s):

Semiconductor Manufacturing

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AI-FDC: Automated Top Down System for Fab Wide Process Equipment Health Monitoring

2020 International Symposium on Semiconductor Manufacturing (ISSM) ◽

10.1109/issm51728.2020.9377500 ◽

2020 ◽

Author(s):

Richard Burch ◽

Michael Keleher ◽

Kazuki Kunitoshi

Keyword(s):

Health Monitoring ◽

Process Equipment ◽

Top Down

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Process Optimization of Trench Field Plate Power MOSFETs with Sequential Phosphorus-Doped Silicon

2020 International Symposium on Semiconductor Manufacturing (ISSM) ◽

10.1109/issm51728.2020.9377528 ◽

2020 ◽

Author(s):

Kota Tomita ◽

Tatsuya Shiraishi ◽

Hiroaki Kato ◽

Hiroyuki Kishimoto ◽

Katsura Miyashita ◽

...

Keyword(s):

Process Optimization ◽

Power Mosfets ◽

Field Plate ◽

Doped Silicon ◽

Phosphorus Doped

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Minimization of CNN Training Data by using Data Augmentation for Inline Defect Classification

2020 International Symposium on Semiconductor Manufacturing (ISSM) ◽

10.1109/issm51728.2020.9377504 ◽

2020 ◽

Author(s):

Akihiro Fujishiro ◽

Yoshikazu Nagamura ◽

Tatsuya Usami ◽

Masao Inoue

Keyword(s):

Data Augmentation ◽

Training Data ◽

Defect Classification ◽

Using Data

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2020 International Symposium on Semiconductor Manufacturing (ISSM)Latest Publications

TOTAL DOCUMENTS

H-INDEX

Published By IEEE

Using Quartz Crystal Microbalance to Provide Real-Time Process Monitoring

Seasoning Optimization by Using Optical Emission Spectroscopy

A Statistical Study on Highly Accurate Quality Prediction for High-mix Low-Volume Semiconductor Products

The Benefits of Real-time Cloud Analytics in Semiconductor

Planned Maintenance Schedule Update Method for Predictive Maintenance of Semiconductor Plasma Etcher

Feature Extraction from Equipment Sensor Signals with Time Series Clustering and Its Application to Defect Prediction

Chamber and Recipe- Independent FDC indicator in High - mix Semiconductor Manufacturing

AI-FDC: Automated Top Down System for Fab Wide Process Equipment Health Monitoring

Process Optimization of Trench Field Plate Power MOSFETs with Sequential Phosphorus-Doped Silicon

Minimization of CNN Training Data by using Data Augmentation for Inline Defect Classification

2020 International Symposium on Semiconductor Manufacturing (ISSM)
Latest Publications