2007 IEEE Symposium on VLSI Technology
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9784900784031
Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Technology Scaling and Device Design for 350 GHz RF Performance in a 45nm Bulk CMOS Process

2007 ◽  
Author(s):  
Hongmei Li ◽  
Basanth Jagannathan ◽  
Jing Wang ◽  
Tai-Chi Su ◽  
Susan Sweeney ◽  
...  
Keyword(s):  
Cmos Process ◽  
Device Design ◽  
Technology Scaling ◽  
Rf Performance

Management of Power and Performance with Stress Memorization Technique for 45nm CMOS

2007 ◽  
Author(s):  
A. Eiho ◽  
T. Sanuki ◽  
E. Morifuji ◽  
T. Iwamoto ◽  
G. Sudo ◽  
...  
Keyword(s):  
And Performance

Multiple Stress Memorization In Advanced SOI CMOS Technologies

2007 ◽  
Author(s):  
A. Wei ◽  
M. Wiatr ◽  
A. Mowry ◽  
A. Gehring ◽  
R. Boschke ◽  
...  
Keyword(s):  
Multiple Stress ◽  
Soi Cmos

Stress dependence and poly-pitch scaling characteristics of (110) PMOS drive current

2007 ◽  
Author(s):  
B. Yang ◽  
K. Nummy ◽  
A. Waite ◽  
L. Black ◽  
H. Gossmann ◽  
...  
Keyword(s):  
Stress Dependence ◽  
Drive Current

Improving Yields of High Performance 65 nm Chips with Sputtering Top Surface of Dual Stress Liner

2007 ◽  
Author(s):  
Huilong Zhu ◽  
Daewon Yang ◽  
Mahender Kumar ◽  
John Colt ◽  
Jeff Maxson ◽  
...  
Keyword(s):  
High Performance
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