Photomask Technology 2018
Latest Publications

TOTAL DOCUMENTS

45
(FIVE YEARS 2)

H-INDEX

3
(FIVE YEARS 1)

Published By SPIE

9781510622159, 9781510622166
Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

AIMSTM EUV first insertion into the back end of the line of a mask shop: a crucial step enabling EUV production

2019 ◽  
Author(s):  
Renzo Capelli ◽  
Nathan Wilcox ◽  
Dirk Hellweg ◽  
Martin Dietzel ◽  
Scott Chegwidden ◽  
...  
Keyword(s):  
Crucial Step

Mask process correction validation for multi-beam mask lithography

2018 ◽  
Author(s):  
Ingo Bork ◽  
Peter Buck ◽  
Bhardwaj Durvasula ◽  
Stefan Eder-Kapl ◽  
Peter Hudek ◽  
...  

AIMS™ EUV tool platform: aerial-image based qualification of EUV masks (Conference Presentation)

2018 ◽  
Author(s):  
Renzo Capelli ◽  
Dirk Hellweg ◽  
Martin Dietzel ◽  
Ralf Gehrke ◽  
Markus Bauer ◽  
...  
Keyword(s):  
Aerial Image

Lithographic benefits and mask manufacturability study of curvilinear masks

2018 ◽  
Author(s):  
Alexander Wei ◽  
Wei Guo ◽  
Fan Jiang ◽  
Jed Rankin ◽  
Alexander Tritchkov ◽  
...  

E-beam based EUV mask characterization for studying mask induced wafer effects

2018 ◽  
Author(s):  
Vidya Vaenkatesan ◽  
Qing Tian ◽  
Emily Gallagher ◽  
Jim Wiley ◽  
Jo Finders ◽  
...  
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