Gate Dielectrics and MOS ULSIs - Springer Series in Electronics and Photonics
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Published By Springer Berlin Heidelberg

9783642645877, 9783642608568

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MIS Structure

Gate Dielectrics and MOS ULSIs - Springer Series in Electronics and Photonics ◽

10.1007/978-3-642-60856-8_2 ◽

1997 ◽

pp. 23-74 ◽

Author(s):

Takashi Hori

Keyword(s):

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Thermally Grown Silicon Oxide

Gate Dielectrics and MOS ULSIs - Springer Series in Electronics and Photonics ◽

10.1007/978-3-642-60856-8_4 ◽

1997 ◽

pp. 149-207

Author(s):

Takashi Hori

Keyword(s):

Silicon Oxide ◽

Thermally Grown

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Thermally Nitrided Oxides: for Flash Memories

Gate Dielectrics and MOS ULSIs - Springer Series in Electronics and Photonics ◽

10.1007/978-3-642-60856-8_5 ◽

1997 ◽

pp. 209-295 ◽

Author(s):

Takashi Hori

Keyword(s):

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Films with High Dielectric Constants: for Passive Capacitance

Gate Dielectrics and MOS ULSIs - Springer Series in Electronics and Photonics ◽

10.1007/978-3-642-60856-8_6 ◽

1997 ◽

pp. 297-324

Author(s):

Takashi Hori

Keyword(s):

Dielectric Constants ◽

High Dielectric

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Introduction

Gate Dielectrics and MOS ULSIs - Springer Series in Electronics and Photonics ◽

10.1007/978-3-642-60856-8_1 ◽

1997 ◽

pp. 1-22 ◽

Author(s):

Takashi Hori

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MOS Fielid-Effect Transistor

Gate Dielectrics and MOS ULSIs - Springer Series in Electronics and Photonics ◽

10.1007/978-3-642-60856-8_3 ◽

1997 ◽

pp. 75-147

Author(s):

Takashi Hori

Keyword(s):

Effect Transistor

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