Particulate Surface Contamination and Device Failures

Author(s):  
Joseph R. Monkowski
1991 ◽  
pp. 249-256
Author(s):  
Philip C. D. Hobbs ◽  
J. Samuel Batchelder ◽  
Vaughn P. Gross ◽  
Kenneth D. Murray

Author(s):  
Marie-Louise Frank ◽  
Ernst Becker ◽  
Julia Schultz ◽  
Ulrike Hähner ◽  
Irene Brückle ◽  
...  

AbstractThis article discusses the use of electrostatic cleaning technology to remove loose particulate surface contamination - which here includes microbial contaminants such as spores, conidia and hyphal fragments - from two 19th century albumen photographs mounted on cardboard. The results of this study, obtained using light microscopy, SEM/EDX and microbiological methods, as well as conservators' visual evaluation, show that the technology is fundamentally suitable for removing microbial contamination from photographic prints and their cardboard mounts. Cleaning the surface four times with electrostatically charged foils reduced the microbial contamination by up to 70%. The surface of the albumen print, which is sensitive to abrasion, was not harmed, and its characteristic features were not changed. The photographs, which were partly delaminated from the cardboard support and the mechanically weakened cardboard, could be treated without creating any additional damage.


2002 ◽  
Author(s):  
M. Hoover ◽  
M. McCawley ◽  
D. Yereb ◽  
S. Tinkle ◽  
S. Beaton ◽  
...  

Author(s):  
Hua Younan

Abstract A failure analysis flow is developed for surface contamination, corrosion and underetch on microchip Al bondpads and it is applied in wafer fabrication. SEM, EDX, Auger, FTIR, XPS and TOF-SIMS are used to identify the root causes. The results from carbon related contamination, galvanic corrosion, fluorine-induced corrosion, passivation underetch and Auger bondpad monitoring will be presented. The failure analysis flow will definitely help us to select suitable methods and tools for failure analysis of Al bondpad-related issues, identify rapidly possible root causes of the failures and find the eliminating solutions at both wafer fabrication and assembly houses.


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