Laser Ablation Deposition of Metallic Thin Films

Author(s):  
James P. Gavigan
2004 ◽  
Author(s):  
Nicusor D. Scarisoreanu ◽  
Ionut Nicolae ◽  
Constantin Grigoriu ◽  
Maria Dinescu ◽  
Makoto Hirai ◽  
...  

1989 ◽  
Vol 151 ◽  
Author(s):  
J. P. Rebouiliat ◽  
B. Michelutti ◽  
Y. Souche ◽  
J. P. Gavigan ◽  
D. Givord ◽  
...  

ABSTRACTSeveral experiments have been carried out to characterize the laser ablation deposition of metallic thin films as a function of the various process parameters. Ablation thresholds have been investigated for Al, Cu and Au targets as a function of wavelength as well as the fluence dependence of ablation rate. The effect of electric fields on the particle component of the ablated material has been investigated. Measurements of the velocity distribution of these particles have also been carried out for Al, Cu and Au targets as a function of the laser parameters with a view to using a velocity filter to remove the particles from the ablated beam.


1993 ◽  
Vol 121 (1-3) ◽  
pp. 94-101 ◽  
Author(s):  
N. Cherief ◽  
D. Givord ◽  
A. Liénard ◽  
K. Mackay ◽  
O.F.K. McGrath ◽  
...  

Author(s):  
M. Grant Norton ◽  
C. Barry Carter

Pulsed-laser ablation has been widely used to produce high-quality thin films of YBa2Cu3O7-δ on a range of substrate materials. The nonequilibrium nature of the process allows congruent deposition of oxides with complex stoichiometrics. In the high power density regime produced by the UV excimer lasers the ablated species includes a mixture of neutral atoms, molecules and ions. All these species play an important role in thin-film deposition. However, changes in the deposition parameters have been shown to affect the microstructure of thin YBa2Cu3O7-δ films. The formation of metastable configurations is possible because at the low substrate temperatures used, only shortrange rearrangement on the substrate surface can occur. The parameters associated directly with the laser ablation process, those determining the nature of the process, e g. thermal or nonthermal volatilization, have been classified as ‘primary parameters'. Other parameters may also affect the microstructure of the thin film. In this paper, the effects of these ‘secondary parameters' on the microstructure of YBa2Cu3O7-δ films will be discussed. Examples of 'secondary parameters' include the substrate temperature and the oxygen partial pressure during deposition.


Author(s):  
R. H. Geiss

The theory and practical limitations of micro area scanning transmission electron diffraction (MASTED) will be presented. It has been demonstrated that MASTED patterns of metallic thin films from areas as small as 30 Åin diameter may be obtained with the standard STEM unit available for the Philips 301 TEM. The key to the successful application of MASTED to very small area diffraction is the proper use of the electron optics of the STEM unit. First the objective lens current must be adjusted such that the image of the C2 aperture is quasi-stationary under the action of the rocking beam (obtained with 40-80-160 SEM settings of the P301). Second, the sample must be elevated to coincide with the C2 aperture image and its image also be quasi-stationary. This sample height adjustment must be entirely mechanical after the objective lens current has been fixed in the first step.


2001 ◽  
Vol 121 (3) ◽  
pp. 124-128
Author(s):  
Zhan-Jie Wang ◽  
Wen-Mei Lin ◽  
Ryutaro Maeda

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