Laser Ablation Deposition (LAD) of Metallic Thin Films

1989 ◽  
Vol 151 ◽  
Author(s):  
J. P. Rebouiliat ◽  
B. Michelutti ◽  
Y. Souche ◽  
J. P. Gavigan ◽  
D. Givord ◽  
...  
Keyword(s):  
Thin Films ◽  
Laser Ablation ◽  
Velocity Distribution ◽  
Electric Fields ◽  
Process Parameters ◽  
Ablation Rate ◽  
Metallic Thin Films ◽  
Laser Parameters ◽  
Velocity Filter ◽  
Fluence Dependence

ABSTRACTSeveral experiments have been carried out to characterize the laser ablation deposition of metallic thin films as a function of the various process parameters. Ablation thresholds have been investigated for Al, Cu and Au targets as a function of wavelength as well as the fluence dependence of ablation rate. The effect of electric fields on the particle component of the ablated material has been investigated. Measurements of the velocity distribution of these particles have also been carried out for Al, Cu and Au targets as a function of the laser parameters with a view to using a velocity filter to remove the particles from the ablated beam.

Analysis of damage formation and propagation in metallic thin films under the action of thermal stresses and electric fields

1996 ◽  
Vol 2 (3) ◽  
pp. 231-258 ◽  
Author(s):  
Dimitrios Maroudas ◽  
Matthew N. Enmark ◽  
Cora M. Leibig ◽  
Sokrates T. Pantelides
Keyword(s):  
Thin Films ◽  
Electric Fields ◽  
Thermal Stresses ◽  
Metallic Thin Films

Pt, Pd, Ni metallic thin films deposited by pulsed laser ablation

2004 ◽  
Author(s):  
Nicusor D. Scarisoreanu ◽  
Ionut Nicolae ◽  
Constantin Grigoriu ◽  
Maria Dinescu ◽  
Makoto Hirai ◽  
...  
Keyword(s):  
Thin Films ◽  
Laser Ablation ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Metallic Thin Films

Laser ablation deposition and magnetic characterization of metallic thin films based on rare earth and transition metals

1993 ◽  
Vol 121 (1-3) ◽  
pp. 94-101 ◽  
Author(s):  
N. Cherief ◽  
D. Givord ◽  
A. Liénard ◽  
K. Mackay ◽  
O.F.K. McGrath ◽  
...  
Keyword(s):  
Thin Films ◽  
Rare Earth ◽  
Laser Ablation ◽  
Transition Metals ◽  
Metallic Thin Films ◽  
Magnetic Characterization

Observations on the growth of YBa2Cu3O7-δ thin films on MgO by pulsed-laser ablation

1991 ◽  
Vol 49 ◽  
pp. 1068-1069
Author(s):  
M. Grant Norton ◽  
C. Barry Carter
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Laser Ablation ◽  
Substrate Surface ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Laser Ablation Process ◽  
Deposition Parameters

Pulsed-laser ablation has been widely used to produce high-quality thin films of YBa2Cu3O7-δ on a range of substrate materials. The nonequilibrium nature of the process allows congruent deposition of oxides with complex stoichiometrics. In the high power density regime produced by the UV excimer lasers the ablated species includes a mixture of neutral atoms, molecules and ions. All these species play an important role in thin-film deposition. However, changes in the deposition parameters have been shown to affect the microstructure of thin YBa2Cu3O7-δ films. The formation of metastable configurations is possible because at the low substrate temperatures used, only shortrange rearrangement on the substrate surface can occur. The parameters associated directly with the laser ablation process, those determining the nature of the process, e g. thermal or nonthermal volatilization, have been classified as ‘primary parameters'. Other parameters may also affect the microstructure of the thin film. In this paper, the effects of these ‘secondary parameters' on the microstructure of YBa2Cu3O7-δ films will be discussed. Examples of 'secondary parameters' include the substrate temperature and the oxygen partial pressure during deposition.

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