Si-Ge Quantum Dot Laser: What Can We Learn From III-V Experience?

2003 ◽  
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N. N. Ledentsov
2008 ◽  
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R. Raghunathan ◽  
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2009 ◽  
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Hao-Hsiung Lin ◽  
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Hui-Hong Yuan ◽  
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Tao Yang

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AbstractThis paper presents electrical transfer (Id-Vg) and output (Id-Vds) characteristics of a GeOx-cladded-Ge quantum dot (QD) gate Si MOSFET devices. In QD gate FETs, the manifestation of an intermediate state ‘i” makes it a 3-state device. The intermediate state originates due to compensation of increment in the gate voltage by a similar increase in the threshold voltage, which occurs via charge neutralization in the QD gate due to transfer of charge from the inversion layer to either first or second of the two QD layers.


2011 ◽  
Vol 23 (14) ◽  
pp. 1019-1021 ◽  
Author(s):  
Yan Li ◽  
Magnus Breivik ◽  
Cheng-Yong Feng ◽  
Bjørn-Ove Fimland ◽  
Luke. F. Lester

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