Role of Borehole Information in Minimizing Uncertainties in Surface Wave Testing

2022 ◽  
pp. 55-65
Author(s):  
Aniket Desai ◽  
Alla Kranthikumar ◽  
Ravi S. Jakka
Keyword(s):  
Surface Wave

Review of the role of dielectric anisotropy in Dyakonov surface-wave propagation

2008 ◽  
Author(s):  
Sudarshan R. Nelatury II ◽  
John A. Polo, Jr. ◽  
Akhlesh Lakhtakia
Keyword(s):  
Wave Propagation ◽  
Surface Wave ◽  
Dielectric Anisotropy ◽  
Surface Wave Propagation

The role of a flame-induced liquid surface wave on pulsating flame spread

2002 ◽  
Vol 29 (1) ◽  
pp. 267-272 ◽  
Author(s):  
T. Konishi ◽  
A. Ito ◽  
Y. Kudou ◽  
K. Saito
Keyword(s):  
Surface Wave ◽  
Flame Spread ◽  
Liquid Surface

The role of pressure on thin amorphous carbon films deposited using microwave surface wave plasma CVD

2006 ◽  
Vol 15 (11-12) ◽  
pp. 1792-1794 ◽  
Author(s):  
Dilip Chandra Ghimire ◽  
Sudip Adhikari ◽  
Hideo Uchida ◽  
Masayoshi Umeno
Keyword(s):  
Surface Wave ◽  
Amorphous Carbon ◽  
Carbon Films ◽  
Plasma Cvd ◽  
Amorphous Carbon Films

Design of Phononic Materials/Structures Using Toplogy Optimization

2006 ◽  
Author(s):  
Cory J. Rupp ◽  
Anton Evgrafov ◽  
Kurt Maute ◽  
Martin L. Dunn
Keyword(s):  
Thin Film ◽  
Topology Optimization ◽  
Surface Wave ◽  
Three Dimensional ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Optimization Approach ◽  
Feature Resolution ◽  
Wave Device

We develop a topology optimization approach to design two- and three-dimensional phononic materials/structures. Whereas most phononic crystals are based on ideas of periodicity, our approach relieves us of this constraint and allows for the creation of much more complex and efficient designs. It also enables us to go beyond simple filters and waveguides to the point of creating phononic devices. We focus on surface wave devices which carry the energy of the wave near and along the surface of the device. The design of surface wave devices is particularly attractive given recent advances in nano- and micro-manufacturing processes, such as thin-film deposition, etching, and lithography, which make it possible to precisely place thin film materials on a substrate with sub-micron feature resolution. The thin films can be made thick enough to affect most of the energy propagating in the surface wave and therefore a patterned thin film is all that is needed to create a surface wave device. It is the role of topology optimization to determine this pattern.

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