scholarly journals Deposition of mass-selected cluster ions using a pulsed arc cluster-ion source

2001 ◽  
Vol 73 (5) ◽  
pp. 547-554 ◽  
Author(s):  
B. Klipp ◽  
M. Grass ◽  
J. Müller ◽  
D. Stolcic ◽  
U. Lutz ◽  
...  
Keyword(s):  
Ion Source ◽  
Cluster Ions ◽  
Cluster Ion Source ◽  
Cluster Ion ◽  
Pulsed Arc

Deposition of Nanocrystalline Metal Films by Cluster Beams Produced by a Pulsed Arc Cluster Ion Source

1996 ◽  
Vol 235-238 ◽  
pp. 267-272 ◽  
Author(s):  
E. Barborini ◽  
P. Piseri ◽  
P. Milani ◽  
Salvatore Iannotta
Keyword(s):  
Metal Films ◽  
Ion Source ◽  
Nanocrystalline Metal ◽  
Cluster Ion Source ◽  
Cluster Ion ◽  
Cluster Beams ◽  
Pulsed Arc

VUV-photoelectron spectroscopy on lead clusters deposited from the pulsed arc cluster ion source (PACIS)

1993 ◽  
Vol 90 (2) ◽  
pp. 201-206 ◽  
Author(s):  
H. R. Siekmann ◽  
E. Holub-Krappe ◽  
Bu. Wrenger ◽  
Ch. Pettenkofer ◽  
K. H. Meiwes-Broer
Keyword(s):  
Photoelectron Spectroscopy ◽  
Ion Source ◽  
Cluster Ion Source ◽  
Cluster Ion ◽  
Pulsed Arc

scholarly journals Production of large metallocarbohedrene clusters using a pulsed arc cluster ion source

2001 ◽  
Vol 17 (1) ◽  
pp. 37-41 ◽  
Author(s):  
N. Blessing ◽  
S. Burkart ◽  
G. Ganteför
Keyword(s):  
Ion Source ◽  
Cluster Ion Source ◽  
Cluster Ion ◽  
Pulsed Arc

The pulsed arc cluster ion source (PACIS)

1991 ◽  
Vol 20 (1-4) ◽  
pp. 417-420 ◽  
Author(s):  
H. R. Siekmann ◽  
Ch. L�der ◽  
J. Faehrmann ◽  
H. O. Lutz ◽  
K. H. Meiwes-Broer
Keyword(s):  
Ion Source ◽  
Cluster Ion Source ◽  
Cluster Ion ◽  
Pulsed Arc

Characterization of a Pulsed Arc Cluster Ion Source for the Production of Metal Clusters in Molecular Beams.

1995 ◽  
Vol 400 ◽  
Author(s):  
P. Piseri ◽  
E. Barborini ◽  
P. Milani
Keyword(s):  
Mass Distribution ◽  
Metal Clusters ◽  
Molecular Beams ◽  
Ion Source ◽  
Operation Conditions ◽  
Cluster Ion Source ◽  
Cluster Ion ◽  
Source Operation ◽  
Cluster Beams ◽  
Pulsed Arc

AbstractWe have produced metal clusters with a molecular beam apparatus based on a Pulsed Arc Cluster Ion Source. The source has been optimized in order to generate intense and stable cluster beams of various elements, with a mass distribution ranging from the monomer up to several thousands of atoms. The source operation conditions can be varied in order to control the mass distribution, intensity and velocity of the aggregates. Preliminary results on the synthesis of granular thin films with this technique are also presented.

VUV-spectroscopy of the plasma light emission generated by the pulsed arc cluster ion source (PACIS)

1998 ◽  
Vol 3 (2) ◽  
pp. 179-182 ◽  
Author(s):  
K. Seeger ◽  
L. K�ller ◽  
J. Tiggesb�umker ◽  
K.-H. Meiwes-Broer
Keyword(s):  
Light Emission ◽  
Ion Source ◽  
Cluster Ion Source ◽  
Cluster Ion ◽  
Vuv Spectroscopy ◽  
Pulsed Arc

Generation of fullerenes and metal–carbon clusters in a pulsed arc cluster ion source (PACIS)

1996 ◽  
Vol 104 (17) ◽  
pp. 6577-6581 ◽  
Author(s):  
Wenyun Lu ◽  
Rongbin Huang ◽  
Junqi Ding ◽  
Shihe Yang
Keyword(s):  
Ion Source ◽  
Carbon Clusters ◽  
Cluster Ion Source ◽  
Cluster Ion ◽  
Metal Carbon Clusters ◽  
Pulsed Arc

The pulsed arc cluster ion source (PACIS)

1991 ◽  
pp. 867-870
Author(s):  
H. R. Siekmann ◽  
Ch. Lüder ◽  
J. Faehrmann ◽  
H. O. Lutz ◽  
K. H. Meiwes-Broer
Keyword(s):  
Ion Source ◽  
Cluster Ion Source ◽  
Cluster Ion ◽  
Pulsed Arc

scholarly journals Pure metal and metal-doped rare-gas clusters grown in a pulsed ARC cluster ion source

1990 ◽  
Vol 165 (4) ◽  
pp. 293-296 ◽  
Author(s):  
G. Ganteför ◽  
H.R. Siekmann ◽  
H.O. Lutz ◽  
K.H. Meiwes-Broer
Keyword(s):  
Pure Metal ◽  
Ion Source ◽  
Rare Gas ◽  
Cluster Ion Source ◽  
Cluster Ion ◽  
Gas Clusters ◽  
Metal Doped ◽  
Pulsed Arc ◽  
Rare Gas Clusters

A New Type of Cluster-Ion Source for Thin Film Deposition

1990 ◽  
Vol 206 ◽  
Author(s):  
Hellmut Haberland ◽  
Martin Karrais ◽  
Martin Mall
Keyword(s):  
Electron Impact ◽  
Plane Surface ◽  
Thin Film Deposition ◽  
Ion Source ◽  
Film Deposition ◽  
Cluster Ions ◽  
Cluster Ion ◽  
Impact Ionisation ◽  
Aggregation Technique ◽  
High Degree

ABSTRACTAtoms are gas discharge sputtered from a solid target. They are condensed to form clusters using the gas aggregation technique. An intense beam of clusters of all solid materials can be obtained. Up to 80 % of the clusters can be ionised without using additional electron impact ionisation. Total deposition rates vary between 1 and 1000 Å per second depending on cluster diameter, which can be varied between 3 and 500 nm. Thin films of Al, Cu, and Mo have been produced so far. For non accelerated beams a weakly adhering mostly coulored deposit is obtained. Accelerating the cluster ions this changes to a strongly adhering film, having a shiny metallic appearance, and a very sharp and plane surface as seen in an electron microscope. The advantages compared to Kyoto ICB-method are: easy control of the cluster size, no electron impact ionisation, high degree of ionisation, and sputtering is used instead of thermal evaporation, which allows the use of high melting point materials.

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