Microwave Characteristics Analysis of Typical Photosensitive Material InP Under Weak Light Irradiation Based on Quasi-Optical Resonator

2020 ◽  
Vol 16 (2) ◽  
pp. 131-139
Author(s):  
Yafeng Li ◽  
En Li ◽  
Chengyong Yu ◽  
Chong Gao ◽  
Gaofeng Guo ◽  
...  
Keyword(s):  
Optical Resonator ◽  
Light Irradiation ◽  
Photosensitive Material ◽  
Characteristics Analysis ◽  
Weak Light ◽  
Microwave Characteristics

scholarly journals Microwave characteristics analysis of photosensitive material InP under weak optical irradiation

2020 ◽  
Vol 18 ◽  
pp. 103202
Author(s):  
Yafeng Li ◽  
Xianwei Gao ◽  
Chengyong Yu ◽  
En Li ◽  
Chong Gao ◽  
...  
Keyword(s):  
Photosensitive Material ◽  
Optical Irradiation ◽  
Characteristics Analysis ◽  
Microwave Characteristics

scholarly journals Enhanced photocatalytic activity for degrading phenol in seawater by TiO2-based catalysts under weak light irradiation

RSC Advances ◽  
2017 ◽  
Vol 7 (51) ◽  
pp. 31921-31929 ◽  
Author(s):  
Ting Wang ◽  
Zhi-yong Xu ◽  
Li-guang Wu ◽  
Bing-rui Li ◽  
Mei-xi Chen ◽  
...  
Keyword(s):  
Photocatalytic Activity ◽  
Light Irradiation ◽  
Phenol Adsorption ◽  
Photodegradation Efficiency ◽  
Weak Light

Given the small size and distribution of TiO2, catalysts with strong phenol adsorption showed high photodegradation efficiency in seawater.

A weak-light-responsive TiO2/g-C3N4 composite film: photocatalytic activity under low-intensity light irradiation

2018 ◽  
Vol 25 (20) ◽  
pp. 20206-20216 ◽  
Author(s):  
Peifang Wang ◽  
Xiang Guo ◽  
Lei Rao ◽  
Chao Wang ◽  
Yong Guo ◽  
...  
Keyword(s):  
Photocatalytic Activity ◽  
Composite Film ◽  
Light Irradiation ◽  
Low Intensity ◽  
Weak Light

Micropatterning of Permalloy Films by Electron Lithography

1976 ◽  
Vol 34 ◽  
pp. 448-449
Author(s):  
J. K. Maurin
Keyword(s):  
Electron Beam ◽  
Subsequent Development ◽  
Electron Optical System ◽  
Microelectronic Device ◽  
Magnetic Bubble ◽  
Control Beam ◽  
Photosensitive Material ◽  
Direct Exposure ◽  
Electron Lithography ◽  
Scanning Electron

Conductor, resistor, and dielectric patterns of microelectronic device are usually defined by exposure of a photosensitive material through a mask onto the device with subsequent development of the photoresist and chemical removal of the undesired materials. Standard optical techniques are limited and electron lithography provides several important advantages, including the ability to expose features as small as 1,000 Å, and direct exposure on the wafer with no intermediate mask. This presentation is intended to report how electron lithography was used to define the permalloy patterns which are used to manipulate domains in magnetic bubble memory devices.The electron optical system used in our experiment as shown in Fig. 1 consisted of a high resolution scanning electron microscope, a computer, and a high precision motorized specimen stage. The computer is appropriately interfaced to address the electron beam, control beam exposure, and move the specimen stage.

Impedance Characteristics Analysis of the Non-Contact Magnetic Type Position Sensor

2008 ◽  
Vol 128 (11) ◽  
pp. 435-441
Author(s):  
Seung-ho Yang ◽  
Katsuhiro Hirata ◽  
Tomohiro Ota ◽  
Yoshio Mitsutake ◽  
Yoshihiro Kawase
Keyword(s):  
Position Sensor ◽  
Impedance Characteristics ◽  
Characteristics Analysis ◽  
Magnetic Type

Microstructure Evolution Induced by Ultraviolet Light Irradiation in Ti-Si Codoped Diamond-like Carbon films

2014 ◽  
Vol 29 (9) ◽  
pp. 941
Author(s):  
JIANG Jin-Long ◽  
WANG Qiong ◽  
HUANG Hao ◽  
ZHANG Xia ◽  
WANG Yu-Bao ◽  
...  
Keyword(s):  
Ultraviolet Light ◽  
Microstructure Evolution ◽  
Carbon Films ◽  
Light Irradiation ◽  
Diamond Like Carbon ◽  
Ultraviolet Light Irradiation
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