Plasma-activated high rate electron beam evaporation using a spotless cathodic arc

Surface and Coatings Technology ◽

10.1016/0257-8972(94)90256-9 ◽

1994 ◽

Vol 68-69 ◽

pp. 799-803 ◽

Author(s):

K. Goedicke ◽

B. Scheffel ◽

S. Schiller

Keyword(s):

Electron Beam ◽

Electron Beam Evaporation ◽

High Rate ◽

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Comparison between electron beam evaporation and high rate sputtering with a plasmatron

Thin Solid Films ◽

10.1016/0040-6090(77)90274-7 ◽

1977 ◽

Vol 45 (2) ◽

pp. 385

Author(s):

S. Schiller ◽

U. Heisig ◽

K. Goedicke ◽

G. Jaesch

Keyword(s):

Electron Beam ◽

Electron Beam Evaporation ◽

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Novelinsitumethod for locating virtual source in high‐rate electron‐beam evaporation

Applied Physics Letters ◽

10.1063/1.112970 ◽

1994 ◽

Vol 65 (2) ◽

pp. 251-253 ◽

Author(s):

M. S. Bhatia

Keyword(s):

Electron Beam ◽

Electron Beam Evaporation ◽

High Rate ◽

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Plasma-activated high-rate electron-beam evaporation for coating metal strips

Materials Science and Engineering ◽

10.1016/0025-5416(93)90003-o ◽

1993 ◽

Vol 163 (2) ◽

pp. 149-156 ◽

Author(s):

S Schiller

Keyword(s):

Electron Beam ◽

Electron Beam Evaporation ◽

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Experimental and theoretical studies of coating thickness distributions obtained from high rate electron beam evaporation sources

Thin Solid Films ◽

10.1016/s0040-6090(96)09123-7 ◽

1997 ◽

Vol 293 (1-2) ◽

pp. 124-132 ◽

Author(s):

O. Piot ◽

A. Malaurie ◽

J. Machet

Keyword(s):

Electron Beam ◽

Coating Thickness ◽

Electron Beam Evaporation ◽

High Rate ◽

Theoretical Studies ◽

Experimental And Theoretical Studies

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High rate electron beam evaporation

Thin Solid Films ◽

10.1016/0040-6090(83)90219-5 ◽

1983 ◽

Vol 110 (2) ◽

pp. 149-164 ◽

Author(s):

S. Schiller ◽

G. Jaesch ◽

M. Neumann

Keyword(s):

Electron Beam ◽

Electron Beam Evaporation ◽

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In situ-force measurement for the determination of the evaporation rate with high-rate electron beam evaporation

Surface and Coatings Technology ◽

10.1016/s0257-8972(97)00314-9 ◽

1998 ◽

Vol 98 (1-3) ◽

pp. 944-947 ◽

Author(s):

B. Scheffel ◽

K. Goedicke

Keyword(s):

Electron Beam ◽

Evaporation Rate ◽

Force Measurement ◽

Electron Beam Evaporation ◽

High Rate ◽

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Plasma-assisted reactive high-rate vapor deposition of yttria-stabilized zirconia using electron beam evaporation and spotless vacuum arc

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2017.03.011 ◽

2017 ◽

Vol 316 ◽

pp. 155-161

Author(s):

Bert Scheffel ◽

Olaf Zywitzki ◽

Christoph Metzner

Keyword(s):

Electron Beam ◽

Vapor Deposition ◽

Electron Beam Evaporation ◽

Yttria Stabilized Zirconia ◽

High Rate ◽

Stabilized Zirconia

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Plasma Activated Electron Beam Evaporation for High-Rate Coating of 3D-Parts

61st Annual Technical Conference Proceedings ◽

10.14332/svc18.proc.0028 ◽

2018 ◽

Author(s):

Jens-Peter Heinß

Keyword(s):

Electron Beam ◽

Electron Beam Evaporation ◽

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Reactive high-rate deposition of titanium oxide coatings using electron beam evaporation, spotless arc and dual crucible

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2015.12.061 ◽

2016 ◽

Vol 287 ◽

pp. 138-144 ◽

Author(s):

Bert Scheffel ◽

Thomas Modes ◽

Christoph Metzner

Keyword(s):

Electron Beam ◽

Titanium Oxide ◽

Electron Beam Evaporation ◽

High Rate ◽

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Plasma-activated high-rate electron-beam evaporation for coating metal strips

Materials Science and Engineering A ◽

10.1016/0921-5093(93)90780-i ◽

1993 ◽

Vol 163 (2) ◽

pp. 149-156 ◽

Author(s):

S. Schiller ◽

K. Goedicke ◽

C. Metzner

Keyword(s):

Electron Beam ◽

Electron Beam Evaporation ◽

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