Inhibition of copper corrosion by the formation of Schiff base self-assembled monolayers

2016 ◽  
Vol 389 ◽  
pp. 601-608 ◽  
Author(s):  
Jing Zhang ◽  
Zheng Liu ◽  
Guo-Cheng Han ◽  
Shi-Liang Chen ◽  
Zhencheng Chen
2009 ◽  
Vol 39 (8) ◽  
pp. 1193-1198 ◽  
Author(s):  
Da-Quan Zhang ◽  
Xian-Ming He ◽  
Qi-Rui Cai ◽  
Li-Xin Gao ◽  
Gui Soon Kim

2002 ◽  
Vol 18 (09) ◽  
pp. 846-849
Author(s):  
Wang Ning ◽  
◽  
Ding Ke-Qiang ◽  
Tong Ru-Ting ◽  
Shao Hui-Bo

2017 ◽  
Vol 120 ◽  
pp. 231-238 ◽  
Author(s):  
Huanjie Yu ◽  
Caixia Li ◽  
Boyu Yuan ◽  
Liang Li ◽  
Chao Wang

2004 ◽  
Vol 2004 (23) ◽  
pp. 4561-4565 ◽  
Author(s):  
Santo Di Bella ◽  
Nicoletta Leonardi ◽  
Giuseppe Consiglio ◽  
Salvatore Sortino ◽  
Ignazio Fragalà

2008 ◽  
Vol 373-374 ◽  
pp. 649-653
Author(s):  
Dang Gang Li ◽  
Xian Jin Yu ◽  
Y.H. Dong ◽  
L.P. Zhang ◽  
Zeng Dian Zhao

The Self-assembled monolayers (SAMs) of Schiff base had been formed on oxidized surfaces of copper. Schiff base used in this paper is N-2-hydroxyphenyl- (3-methoxy-salicylidenimine), designated V-bso. X-ray photoelectron spectroscopy (XPS), polarization curves, electrochemistry impedance spectroscopy (EIS) and the interface capacitance measurements have been employed to investigate the structure, formation and composition of these monolayers. XPS analysis show that the valence of the copper in the surface films is +2. The polarization curves and the EIS results indicate that the films of CuO, V-bso, and V-bso modified oxidized copper all have good corrosion inhibition efficiency. The IE of the V-bso modified oxidized copper is higher than that of the V-bso modified copper and the oxidized copper layer, just because the former has two layers. The results of the interface capacitance show that the self-assemble films of the V-bso on the oxidized copper surface have good potential stability.


Sign in / Sign up

Export Citation Format

Share Document