Factors Affecting the Quality and Corrosion Inhibition Ability of Self-Assembled Monolayers of a Schiff Base

ABSTRACTThis work investigates the effects of concentration of organothiol molecules and temperature used during self-assembled monolayers (SAMs) formation on quality of the organothiol SAMs coating layer obtained in terms of wettability, corrosion inhibition efficiency and carbon to copper ratio. The organothiol SAMs were coated on copper substrates prepared by electro-polishing followed by oxygen plasma treatment for 15 s. Three types of organothiol SAMs including 1-octanethiol (OTT), 2-ethylhexanethiol (2-EHT) and 2-phenylethanethiol (2-PET) were investigated. Concentration of organothiol molecules ranging from 0.005 to 0.02 M in isopropanol and forming temperature ranging from -15 to 50°C were studied. It was found that all organothiol SAMs of 0.01 M provided the SAMs coating layer with the highest quality. The SAMs formed at 40°C with OTT and 2-EHT, and at 0°C with 2-PET were the most favorable condition with the highest water contact angle of 124.79o, 130.66o and 120.58o at corrosion inhibition efficiencies of 96.24%, 99.37% and 98.90%, respectively.

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Fluorescent Self-Assembled Monolayers of Bis(salicylaldiminato)zinc(II) Schiff-Base Complexes

European Journal of Inorganic Chemistry ◽

10.1002/ejic.200400482 ◽

2004 ◽

Vol 2004 (23) ◽

pp. 4561-4565 ◽

Cited By ~ 25

Author(s):

Santo Di Bella ◽

Nicoletta Leonardi ◽

Giuseppe Consiglio ◽

Salvatore Sortino ◽

Ignazio Fragalà

Keyword(s):

Schiff Base ◽

Schiff Base Complexes ◽

Self Assembled Monolayers ◽

Assembled Monolayers ◽

Self Assembled

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Inhibition of copper corrosion by the formation of Schiff base self-assembled monolayers

Applied Surface Science ◽

10.1016/j.apsusc.2016.07.116 ◽

2016 ◽

Vol 389 ◽

pp. 601-608 ◽

Cited By ~ 35

Author(s):

Jing Zhang ◽

Zheng Liu ◽

Guo-Cheng Han ◽

Shi-Liang Chen ◽

Zhencheng Chen

Keyword(s):

Schiff Base ◽

Self Assembled Monolayers ◽

Copper Corrosion ◽

Assembled Monolayers ◽

Self Assembled

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Self-Assembled Monolayers of Schiff Base on the Surfaces of Oxidized Copper

Key Engineering Materials ◽

10.4028/www.scientific.net/kem.373-374.649 ◽

2008 ◽

Vol 373-374 ◽

pp. 649-653

Author(s):

Dang Gang Li ◽

Xian Jin Yu ◽

Y.H. Dong ◽

L.P. Zhang ◽

Zeng Dian Zhao

Keyword(s):

Schiff Base ◽

Photoelectron Spectroscopy ◽

Copper Surface ◽

The Self ◽

Polarization Curves ◽

Self Assembled Monolayers ◽

Surface Films ◽

Assembled Monolayers ◽

Interface Capacitance ◽

Self Assembled

The Self-assembled monolayers (SAMs) of Schiff base had been formed on oxidized surfaces of copper. Schiff base used in this paper is N-2-hydroxyphenyl- (3-methoxy-salicylidenimine), designated V-bso. X-ray photoelectron spectroscopy (XPS), polarization curves, electrochemistry impedance spectroscopy (EIS) and the interface capacitance measurements have been employed to investigate the structure, formation and composition of these monolayers. XPS analysis show that the valence of the copper in the surface films is +2. The polarization curves and the EIS results indicate that the films of CuO, V-bso, and V-bso modified oxidized copper all have good corrosion inhibition efficiency. The IE of the V-bso modified oxidized copper is higher than that of the V-bso modified copper and the oxidized copper layer, just because the former has two layers. The results of the interface capacitance show that the self-assemble films of the V-bso on the oxidized copper surface have good potential stability.

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