A facile surface modification of poly(dimethylsiloxane) with amino acid conjugated self-assembled monolayers for enhanced osteoblast cell behavior

2020 ◽  
Vol 196 ◽  
pp. 111343
Author(s):  
M. Özgen Öztürk-Öncel ◽  
Sedat Odabaş ◽  
Lokman Uzun ◽  
Deniz Hür ◽  
Bora Garipcan
Author(s):  
Jayasheelan Vaithilingam ◽  
Ruth D. Goodridge ◽  
Steven D. R. Christie ◽  
Steve Edmondson ◽  
Richard J. M. Hague

2009 ◽  
Vol 113 (36) ◽  
pp. 16027-16030 ◽  
Author(s):  
Han-Na Hwang ◽  
Jung Sook Kim ◽  
Jung Moo Heo ◽  
Joon Won Park ◽  
Kwang-Jin Hwang ◽  
...  

2012 ◽  
Vol 3 ◽  
pp. 213-220 ◽  
Author(s):  
Inbal Aped ◽  
Yacov Mazuz ◽  
Chaim N Sukenik

Thioester-functionalized, siloxane-anchored, self-assembled monolayers provide a powerful tool for controlling the chemical and physical properties of surfaces. The thioester moiety is relatively stable to long-term storage and its structure can be systematically varied so as to provide a well-defined range of reactivity and wetting properties. The oxidation of thioesters with different-chain-length acyl groups allows for very hydrophobic surfaces to be transformed into very hydrophilic, sulfonic acid-bearing, surfaces. Systematic variation in the length of the polymethylene chain has also allowed us to examine how imbedding reaction sites at various depths in a densely packed monolayer changes their reactivity. π-Systems (benzene and thiophene) conjugated to the thioester carbonyl enable the facile creation of photoreactive surfaces that are able to use light of different wavelengths. These elements of structural diversity combine with the utility of the hydrophilic, strongly negatively charged sulfonate-bearing surface to constitute an important approach to systematic surface modification.


2014 ◽  
Vol 43 (8) ◽  
pp. 2680-2700 ◽  
Author(s):  
Xiaoyu Cheng ◽  
Stuart B. Lowe ◽  
Peter J. Reece ◽  
J. Justin Gooding

Summarizes recent advances in the preparation, surface modification and bio-applications of silicon quantum dots.


2013 ◽  
Author(s):  
S. Ito ◽  
S.W. Lee ◽  
T. Yokota ◽  
T. Tokuhara ◽  
H. Klauk ◽  
...  

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