Improvement of principal component analysis modeling for plasma etch processes through discrete wavelet transform and automatic variable selection
2016 ◽
Vol 94
◽
pp. 362-369
◽
2015 ◽
Vol 12
(3)
◽
pp. 386-399
◽
2018 ◽
Vol 6
(8)
◽
pp. 582-586
2016 ◽