Characteristics of the epitaxy of InGaN-based light-emitting diodes grown by nanoscale epitaxial lateral overgrowth using a nitrided titanium buffer layer
2015 ◽
Vol 157
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pp. 63-68
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2008 ◽
Vol 310
(23)
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pp. 5170-5174
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2008 ◽
2015 ◽
Vol 51
(5)
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pp. 1-5
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Keyword(s):
Keyword(s):
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