Epitaxial thin film growth of garnet-, GdFeO3-, and YMnO3-type LuFeO3 using pulsed laser deposition

2017 ◽  
Vol 642 ◽  
pp. 41-44
Author(s):  
Tsukasa Katayama ◽  
Yosuke Hamasaki ◽  
Shintaro Yasui ◽  
Akiko Miyahara ◽  
Mitsuru Itoh
Keyword(s):  
Thin Film ◽  
Pulsed Laser Deposition ◽  
Film Growth ◽  
Pulsed Laser ◽  
Thin Film Growth ◽  
Laser Deposition ◽  
Epitaxial Thin Film ◽  
Epitaxial Thin Film Growth

Epitaxial thin film growth of Ca2RuO4+δ by pulsed laser deposition

2004 ◽  
Vol 85 (25) ◽  
pp. 6146-6148 ◽  
Author(s):  
X. Wang ◽  
Y. Xin ◽  
P. A. Stampe ◽  
R. J. Kennedy ◽  
J. P. Zheng
Keyword(s):  
Thin Film ◽  
Pulsed Laser Deposition ◽  
Film Growth ◽  
Pulsed Laser ◽  
Thin Film Growth ◽  
Laser Deposition ◽  
Epitaxial Thin Film ◽  
Epitaxial Thin Film Growth

Incongruent pulsed laser deposition strategy for thin film growth of Ca3Co4O9 thermoelectric compound

2019 ◽  
Vol 45 (10) ◽  
pp. 13138-13143 ◽  
Author(s):  
Haiyang Hu ◽  
Fei Shao ◽  
Jikun Chen ◽  
Max Döbeli ◽  
Qingfeng Song ◽  
...  
Keyword(s):  
Thin Film ◽  
Pulsed Laser Deposition ◽  
Film Growth ◽  
Pulsed Laser ◽  
Thin Film Growth ◽  
Laser Deposition

Thin film growth by inverse pulsed laser deposition

2005 ◽  
Vol 484 (1-2) ◽  
pp. 165-169 ◽  
Author(s):  
Tamás Szörényi ◽  
Zsolt Geretovszky
Keyword(s):  
Thin Film ◽  
Pulsed Laser Deposition ◽  
Film Growth ◽  
Pulsed Laser ◽  
Thin Film Growth ◽  
Laser Deposition

Controlled deposition of wedge-shaped profiles for thin (∼10Å) layers by pulsed laser deposition

2003 ◽  
Vol 804 ◽  
Author(s):  
H.M. Christen ◽  
I. Ohkubo
Keyword(s):  
Thin Film ◽  
Pulsed Laser Deposition ◽  
Film Growth ◽  
Pulsed Laser ◽  
Thin Film Growth ◽  
Laser Deposition ◽  
Sample Sizes ◽  
Basic Principles ◽  
Controlled Deposition ◽  
Thin Wedge

ABSTRACTA method yielding precisely controlled thickness profiles in thin-film growth is necessary for continuous compositional spread techniques. While multiple approaches have been introduced and successfully tested, some specific applications require the use of very thin “wedge”-type profiles (∼10 Å at the thickest point), while at the same time yielding lateral sample sizes of several centimeters. Here we introduce the basic principles of a pulsed-laser deposition based approach utilizing the translation of the substrate behind a slit-shaped aperture and demonstrate by simple calculations that this method can satisfy these requirements.

Effect of Ga Re-evaporation on AlxGa1-xN Thin Film Growth by Dual-Beam Pulsed Laser Deposition Method in N2Ambient

2003 ◽  
Vol 42 (Part 1, No. 5A) ◽  
pp. 2856-2857 ◽  
Author(s):  
Yoichiro Masuyama ◽  
Shinsuke Komatsu ◽  
Masaya Kiso ◽  
Kouhei Mizuno ◽  
Takeshi Kobayashi
Keyword(s):  
Thin Film ◽  
Pulsed Laser Deposition ◽  
Film Growth ◽  
Pulsed Laser ◽  
Thin Film Growth ◽  
Laser Deposition ◽  
Deposition Method ◽  
Dual Beam
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