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Adhesion-promoted copolymers based on norbornene derivatives and maleic anhydride for 193-nm photoresists
Polymer
◽
10.1016/s0032-3861(00)00124-5
◽
2000
◽
Vol 41
(22)
◽
pp. 8035-8039
◽
Cited By ~ 5
Author(s):
J.-B Kim
◽
H.-J Yun
◽
Y.-G Kwon
◽
B.-W Lee
Keyword(s):
Maleic Anhydride
◽
193 Nm
◽
Norbornene Derivatives
Download Full-text
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References
Synthesis of Cycloolefin−Maleic Anhydride Alternating Copolymers for 193 nm Imaging
Macromolecules
◽
10.1021/ma970771w
◽
1997
◽
Vol 30
(21)
◽
pp. 6517-6524
◽
Cited By ~ 35
Author(s):
F. M. Houlihan
◽
T. I. Wallow
◽
O. Nalamasu
◽
E. Reichmanis
Keyword(s):
Maleic Anhydride
◽
Alternating Copolymers
◽
193 Nm
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Base additives for use in a single layer 193-nm resist based upon poly(norbornene/maleic anhydride/acrylic acid/ tert -butyl acrylate)
10.1117/12.436912
◽
2001
◽
Cited By ~ 2
Author(s):
Francis M. Houlihan
◽
Donna Person
◽
Omkaram Nalamasu
◽
Ilya Rushkin
◽
Ognian N. Dimov
◽
...
Keyword(s):
Maleic Anhydride
◽
Acrylic Acid
◽
Butyl Acrylate
◽
Single Layer
◽
Tert Butyl
◽
193 Nm
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Ring opened maleic anhydride and norbornene copolymers (ROMA) have a good character in resist flow process for 193-nm resist technology
10.1117/12.485209
◽
2003
◽
Cited By ~ 1
Author(s):
Hyun-Sang Joo
◽
Dong Chul Seo
◽
Chang Min Kim
◽
Young Taek Lim
◽
Seong Duk Cho
◽
...
Keyword(s):
Maleic Anhydride
◽
Flow Process
◽
193 Nm
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Cycloolefin/maleic anhydride copolymers for 193-nm resist compositions
10.1117/12.350170
◽
1999
◽
Cited By ~ 1
Author(s):
M. D. Rahman
◽
Ralph R. Dammel
◽
Michelle M. Cook
◽
Stanley A. Ficner
◽
Munirathna Padmanaban
◽
...
Keyword(s):
Maleic Anhydride
◽
193 Nm
◽
Maleic Anhydride Copolymers
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Poly(t-butyl-3α-(5-norbornene-2-carbonyloxy)-7α,12α-dihydroxy-5β-cholan-24-oate-co-maleic anhydride) for a 193-nm photoresist
Polymer
◽
10.1016/s0032-3861(99)00388-2
◽
1999
◽
Vol 40
(26)
◽
pp. 7423-7426
◽
Cited By ~ 10
Author(s):
Jin-Baek Kim
◽
Bum-Wook Lee
◽
Jae-Sung Kang
◽
Dong-Chul Seo
◽
Chi-Hyung Roh
Keyword(s):
Maleic Anhydride
◽
193 Nm
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Novel hybrid copolymers of cycloolefin/maleic anhydride (COMA)/methacrylate for 193-nm resist compositions
10.1117/12.436845
◽
2001
◽
Cited By ~ 4
Author(s):
M. D. Rahman
◽
Douglas S. McKenzie
◽
Jun-Bom Bae
◽
Takanori Kudo
◽
Woo-Kyu Kim
◽
...
Keyword(s):
Maleic Anhydride
◽
Hybrid Copolymers
◽
193 Nm
Download Full-text
Investigations of the Adhesion of Maleic Anhydride/Cyclic Olefin Alternating Copolymers to Silicon Substrates: Improved Materials for 193 nm Lithography
The Journal of Adhesion
◽
10.1080/00218460210378
◽
2002
◽
Vol 78
(1)
◽
pp. 1-13
◽
Cited By ~ 5
Author(s):
Anthony J. Pasquale
◽
Timothy E. Long
◽
Hoa Truong
◽
Robert D. Allen
Keyword(s):
Maleic Anhydride
◽
Silicon Substrates
◽
Cyclic Olefin
◽
Alternating Copolymers
◽
193 Nm
Download Full-text
Negative Photoresist Materials Based on Poly(Norbornene Derivatives‐co‐styrene‐co‐maleic Anhydride)
Journal of Macromolecular Science Part A
◽
10.1081/ma-200050465
◽
2005
◽
Vol 42
(3)
◽
pp. 327-339
◽
Cited By ~ 2
Author(s):
Ahmed Rehab
Keyword(s):
Maleic Anhydride
◽
Negative Photoresist
◽
Norbornene Derivatives
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Synthesis of Norbornene Derivatives by Diels-Alder Cycloaddition and Subsequent Copolymerization with Maleic Anhydride
Macromolecular Chemistry and Physics
◽
10.1002/macp.200300080
◽
2004
◽
Vol 205
(5)
◽
pp. 621-627
◽
Cited By ~ 7
Author(s):
Anthony J. Pasquale
◽
Ann R. Fornof
◽
Timothy E. Long
Keyword(s):
Maleic Anhydride
◽
Diels Alder
◽
Norbornene Derivatives
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193 nm Single Layer Resist Based on Poly(norbornene-alt-maleic anhydride) Derivatives
ACS Symposium Series - Micro- and Nanopatterning Polymers
◽
10.1021/bk-1998-0706.ch015
◽
1998
◽
pp. 191-207
◽
Cited By ~ 1
Author(s):
F. M. Houlihan
◽
A. Timko
◽
R. Hutton
◽
R. Cirelli
◽
J. M. Kometani
◽
...
Keyword(s):
Maleic Anhydride
◽
Single Layer
◽
193 Nm
Download Full-text
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