Characterization of SrRuO3 thin film grown by laser ablation at temperatures above 400 °C

2001 ◽  
Vol 90 (1) ◽  
pp. 162-166 ◽  
Author(s):  
Xiaodong Fang ◽  
Takeshi Kobayashi
Keyword(s):  
Thin Film ◽  
Laser Ablation ◽  
Srruo3 Thin Film

Physical and electrochemical characterization of LiNi0.8Co0.2O2 thin-film electrodes deposited by laser ablation

2001 ◽  
Vol 97-98 ◽  
pp. 298-302 ◽  
Author(s):  
G.X. Wang ◽  
M.J. Lindsay ◽  
M. Ionescu ◽  
D.H. Bradhurst ◽  
S.X. Dou ◽  
...  
Keyword(s):  
Thin Film ◽  
Laser Ablation ◽  
Electrochemical Characterization ◽  
Thin Film Electrodes

Characterization of rear- and front-side laser ablation plasmas for thin-film deposition

2002 ◽  
Vol 197-198 ◽  
pp. 192-196 ◽  
Author(s):  
L Escobar-Alarcón ◽  
E Camps ◽  
E Haro-Poniatowski ◽  
M Villagran ◽  
C Sanchez
Keyword(s):  
Thin Film ◽  
Laser Ablation ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Front Side

Characterization of the plasma plume and of thin film epitaxially produced during laser ablation of SnSe

1995 ◽  
Vol 90 (4) ◽  
pp. 505-514 ◽  
Author(s):  
R. Teghil ◽  
A. Santagata ◽  
V. Marotta ◽  
S. Orlando ◽  
G. Pizzella ◽  
...  
Keyword(s):  
Thin Film ◽  
Laser Ablation ◽  
Plasma Plume

Observations on the growth of YBa2Cu3O7-δ thin films on MgO by pulsed-laser ablation

1991 ◽  
Vol 49 ◽  
pp. 1068-1069
Author(s):  
M. Grant Norton ◽  
C. Barry Carter
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Laser Ablation ◽  
Substrate Surface ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Laser Ablation Process ◽  
Deposition Parameters

Pulsed-laser ablation has been widely used to produce high-quality thin films of YBa2Cu3O7-δ on a range of substrate materials. The nonequilibrium nature of the process allows congruent deposition of oxides with complex stoichiometrics. In the high power density regime produced by the UV excimer lasers the ablated species includes a mixture of neutral atoms, molecules and ions. All these species play an important role in thin-film deposition. However, changes in the deposition parameters have been shown to affect the microstructure of thin YBa2Cu3O7-δ films. The formation of metastable configurations is possible because at the low substrate temperatures used, only shortrange rearrangement on the substrate surface can occur. The parameters associated directly with the laser ablation process, those determining the nature of the process, e g. thermal or nonthermal volatilization, have been classified as ‘primary parameters'. Other parameters may also affect the microstructure of the thin film. In this paper, the effects of these ‘secondary parameters' on the microstructure of YBa2Cu3O7-δ films will be discussed. Examples of 'secondary parameters' include the substrate temperature and the oxygen partial pressure during deposition.

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