thin film electrodes
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Author(s):  
Do Thi Thuy

Graphene film electrodes have many important applications, but the fabriacion of these electrodes is difficult dues to the poor processing of graphene. This article describes the preliminary results of using 3D printing technology to fabricate thin-film electrodes from graphene oxide inks. Graphene oxide ink is synthesized by chemical method. The graphene oxide (GO) and reduction graphene oxide (r GO) thin film were chacracterized by filed scanning electron microscopy (FESEM) and Energy-dispersive X-ray spectrocopy (EDX spectrocopy) to make sure the morphological and optical characteristics of the thin film. In addition, the electrochemical aera active studies were also determined by cyclic voltametry (CV) curves. The r GO thin film displays higher electrochemical area active in comparison with GO, which is 2.56 cm2 compare to 0.31 cm2, indicating the best result for the superior conductivity of thin film electrode.


2021 ◽  
Vol MA2021-02 (45) ◽  
pp. 1377-1377
Author(s):  
Ozden Celikbilek ◽  
Matthew Wells ◽  
Judith L. Driscoll ◽  
Stephen Skinner

2021 ◽  
Vol 231 ◽  
pp. 111314
Author(s):  
Baolin Sun ◽  
Zexing Liu ◽  
Wei Li ◽  
Hui Huang ◽  
Yang Xia ◽  
...  

2021 ◽  
Vol 4 (9) ◽  
pp. 9046-9056
Author(s):  
Buse Bilbey ◽  
Meltem Sezen ◽  
Cleva W. Ow-Yang ◽  
Busra Tugba Camic ◽  
Aligul Buyukaksoy

Author(s):  
Bouchra Asbani ◽  
Gaetan Buvat ◽  
Jeremy Freixas ◽  
Marielle Huvé ◽  
David Troadec ◽  
...  

2021 ◽  
Vol 3 (6 (111)) ◽  
pp. 53-58
Author(s):  
Valerii Kotok ◽  
Vadym Kovalenko

In this work, the influence of some types of the pulsed deposition mode of electrochromic films from aqueous solutions of nickel nitrate with the addition of polyvinyl alcohol was investigated. Glass coated with a fluorine-doped tin oxide film was used as the basis for deposition. The deposition of nickel (II) hydroxide – polyvinyl alcohol electrochromic films was carried out in three pulsed modes: –0.2 mA/cm2×5 s, 0 mA/cm2×5 s (10 minutes); –0.5 mA/cm2×2 s, 0 mA/cm2×8 s (10 minutes); –1 mA/cm2×1 s, 0 mA/cm2×9 s. In this case, the amount of electricity used for the formation of thin-film electrodes was the same for all samples. The resulting films showed dramatic differences in electrochemical, optical, and quality characteristics. The sample obtained in the mode of the highest cathode current density and the duration of the no-current condition (1 mA/cm2×1 s, 0 mA/cm2×9 s) had the worst specific capacity and optical characteristics. This sample was characterized by the highest number of coating defects and color non-uniformity as well. The sample, which was obtained at average current densities (–0.5 mA/cm2×2 s, 0 mA/cm2×8 s), had the highest specific characteristics among the electrodes in the series. The coating was uniform and solid. Also, this sample had the greatest stability of the coloration depth value, which varied from 79.1 to 78.1 % (first to fifth cycles). The sample obtained in the mode –0.2 mA/cm2×5 s, 0 mA/cm2×5 s showed moderate specific indicators, however, there were some coating defects. According to the results obtained, a mechanism was proposed that explained the differences in the characteristics of thin-film electrodes formed in different modes. This mechanism consists of changing the time of non-stationary processes and the distribution of the current density with a change in the value of the deposition current density, the duration of the cathode period, and the no-current condition.


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