Accelerated dense ion filament formed by ultra intense laser in plasma slab

Author(s):  
H. Amitani
Keyword(s):  
2007 ◽  
Vol 21 (03n04) ◽  
pp. 647-656 ◽  
Author(s):  
EDISON LIANG

We review recent PIC simulation results which show that double-sided irradiation of a thin over-dense plasma slab by ultra-intense laser pulses from both sides can lead to sustained comoving acceleration of surface electrons to energies much higher than the conventional ponderomotive limit. The acceleration stops only when the electrons drift transversely out of the laser beam. We show latest 2.5D results of parameter studies based on finite laser spot size and discuss future laser experiments that can be used to test these results.


Author(s):  
C. J. Joachain ◽  
N. J. Kylstra ◽  
R. M. Potvliege

1993 ◽  
Vol 90 ◽  
pp. 1275-1282 ◽  
Author(s):  
LA Lompré ◽  
P Monot ◽  
T Auguste ◽  
G Mainfray ◽  
C Manus

2006 ◽  
Vol 133 ◽  
pp. 549-551 ◽  
Author(s):  
S. Kawata ◽  
R. Sonobe ◽  
S. Miyazaki ◽  
K. Sakai ◽  
T. Kikuchi

2006 ◽  
Vol 133 ◽  
pp. 515-519
Author(s):  
Y. Rhee ◽  
S. M. Nam ◽  
J. M. Han ◽  
Y. H. Cha ◽  
D. H. Kwon ◽  
...  

1966 ◽  
Vol 27 (C2) ◽  
pp. C2-100-C2-103 ◽  
Author(s):  
J.-B. GRUN ◽  
A. MYSYROWICZ ◽  
S. NIKITINE
Keyword(s):  

1988 ◽  
Author(s):  
Francis X. Hartmann ◽  
Karen K. Garcia ◽  
Donald W. Noid ◽  
Michael L. Koszykowski ◽  
John K. Munro ◽  
...  

Nanophotonics ◽  
2021 ◽  
Vol 0 (0) ◽  
Author(s):  
Elmina Kabouraki ◽  
Vasileia Melissinaki ◽  
Amit Yadav ◽  
Andrius Melninkaitis ◽  
Konstantina Tourlouki ◽  
...  

Abstract Optics manufacturing technology is predicted to play a major role in the future production of integrated photonic circuits. One of the major drawbacks in the realization of photonic circuits is the damage of optical materials by intense laser pulses. Here, we report on the preparation of a series of organic–inorganic hybrid photoresists that exhibit enhanced laser-induced damage threshold. These photoresists showed to be candidates for the fabrication of micro-optical elements (MOEs) using three-dimensional multiphoton lithography. Moreover, they demonstrate pattern ability by nanoimprint lithography, making them suitable for future mass production of MOEs.


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