Erratum: “Annealing-time dependence in interfacial reaction between poly-Si electrode and HfO2∕Si gate stack studied by synchrotron radiation photoemission and x-ray absorption spectroscopy” [Appl. Phys. Lett. 89, 012102 (2006)]
2018 ◽
Vol 90
(3)
◽
pp. 2389-2394
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