scholarly journals Erratum: “Annealing-time dependence in interfacial reaction between poly-Si electrode and HfO2∕Si gate stack studied by synchrotron radiation photoemission and x-ray absorption spectroscopy” [Appl. Phys. Lett. 89, 012102 (2006)]

2006 ◽  
Vol 89 (16) ◽  
pp. 169902 ◽  
Author(s):  
H. Takahashi ◽  
J. Okabayashi ◽  
S. Toyoda ◽  
H. Kumigashira ◽  
M. Oshima ◽  
...  
2019 ◽  
Vol 91 ◽  
pp. 401-407 ◽  
Author(s):  
Simone S. Melo ◽  
Adriano B. Andrade ◽  
Giordano F.C. Bispo ◽  
Jessica C. Carvalho ◽  
Zélia S. Macedo ◽  
...  

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