High-resolution study of the x-ray resonant Raman scattering process around the1sabsorption edge for aluminium, silicon, and their oxides

2007 ◽  
Vol 75 (2) ◽  
Author(s):  
J. Szlachetko ◽  
J.-Cl. Dousse ◽  
M. Berset ◽  
K. Fennane ◽  
M. Szlachetko ◽  
...  
2006 ◽  
Vol 97 (7) ◽  
Author(s):  
J. Szlachetko ◽  
J.-Cl. Dousse ◽  
J. Hoszowska ◽  
M. Pajek ◽  
R. Barrett ◽  
...  

1995 ◽  
Vol 74 (18) ◽  
pp. 3700-3703 ◽  
Author(s):  
Paolo Carra ◽  
Michele Fabrizio ◽  
B. T. Thole

1997 ◽  
Vol 56 (22) ◽  
pp. R14267-R14270 ◽  
Author(s):  
T. Iwazumi ◽  
K. Kobayashi ◽  
S. Kishimoto ◽  
T. Nakamura ◽  
S. Nanao ◽  
...  

2017 ◽  
Vol 32 (2) ◽  
pp. 402-407 ◽  
Author(s):  
J. J. Leani ◽  
R. D. Pérez ◽  
J. I. Robledo ◽  
H. J. Sánchez

X-ray resonant Raman scattering was used, for the first time, in a confocal setup with the aim of determining different compounds of the same element in a copper-multilayer sample.


2010 ◽  
Vol 81 (1) ◽  
Author(s):  
D. Sokaras ◽  
M. Müller ◽  
M. Kolbe ◽  
B. Beckhoff ◽  
Ch. Zarkadas ◽  
...  

1996 ◽  
Vol 54 (22) ◽  
pp. 16010-16023 ◽  
Author(s):  
Michel van Veenendaal ◽  
Paolo Carra ◽  
B. T. Thole

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