Limitation of the Kirchhoff boundary conditions for aerial image simulation in 157-nm optical lithography

2000 ◽  
Vol 21 (9) ◽  
pp. 433-435 ◽  
Author(s):  
M.S. Yeung ◽  
E. Barouch
1997 ◽  
Author(s):  
Eiji Tsujimoto ◽  
Takahiro Watanabe ◽  
Yoshio Sato ◽  
Akemi Moniwa ◽  
Yoshinobu Igarashi ◽  
...  

2003 ◽  
Author(s):  
Yoshikazu Nagamura ◽  
Kunihiro Hosono ◽  
Linyong Pang ◽  
Kevin K. Chan ◽  
Yoshio Tanaka

2014 ◽  
pp. 45-54
Author(s):  
Syarhei M. Avakaw ◽  
Alexander A. Doudkin ◽  
Alexander V. Inyutin ◽  
Aleksey V. Otwagin ◽  
Vladislav A. Rusetsky

A framework for paralleling aerial image simulation in photolithography is proposed. Initial data for the simulation representing photomask are considered as a data stream that is processed by a multi-agent computing system. A parallel image processing is based on a graph model of a parallel algorithm. The algorithm is constructed from individual computing operations in a special visual editor. Then the visual representation is converted into XML, which is interpreted by the multi-agent system based on MPI. The system performs run- time dynamic optimization of calculations using an algorithm of virtual associative network. The proposed framework gives a possibility to design and analyze parallel algorithms and to adapt them to architecture of the computing cluster.


1998 ◽  
Author(s):  
Eli Almog ◽  
Roger F. Caldwell ◽  
Fang C. Chang ◽  
J. Fung Chen ◽  
Nigel R. Farrar ◽  
...  

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