Modeling of through-focus aerial image with aberration and imaginary mask edge effects in optical lithography simulation

2011 ◽  
Vol 50 (20) ◽  
pp. 3570 ◽  
Author(s):  
Kenji Yamazoe ◽  
Andrew R. Neureuther
Keyword(s):  
Edge Effects ◽  
Optical Lithography ◽  
Aerial Image ◽  
Lithography Simulation ◽  
Mask Edge

Lithography simulation with aerial image — Variable threshold resist model

1999 ◽  
Vol 46 (1-4) ◽  
pp. 59-63 ◽  
Author(s):  
John Randall ◽  
Hareen Gangala ◽  
Alexander Tritchkov
Keyword(s):  
Aerial Image ◽  
Variable Threshold ◽  
Lithography Simulation

Optical lithography simulation considering impact of mask errors

2002 ◽  
Author(s):  
Hee-Bom Kim ◽  
Won-Kwang Ma ◽  
Chang-Nam Ahn ◽  
Ki-Soo Shin
Keyword(s):  
Optical Lithography ◽  
Lithography Simulation

Rigorous electromagnetic field model for optical lithography simulation

2015 ◽  
Vol 27 (2) ◽  
pp. 24106
Author(s):  
真王飞 Wang Fei ◽  
周再发 Zhou Zaifa ◽  
李伟华 Li Weihua ◽  
黄庆安 Huang Qing’an
Keyword(s):  
Electromagnetic Field ◽  
Field Model ◽  
Optical Lithography ◽  
Lithography Simulation

scholarly journals Periodic patterning using aerial image modulation with optical lithography

2013 ◽  
Vol 12 (3) ◽  
pp. 033009 ◽  
Author(s):  
Boyan Penkov ◽  
Garry Bordonaro ◽  
Andrii B. Golovin ◽  
Igor Bendoym ◽  
Donald M. Tennant ◽  
...  
Keyword(s):  
Optical Lithography ◽  
Aerial Image
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