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Impact of Taping the Upper Mask Edge on Ocular Surface Stability and Dry Eye Symptoms

2022 ◽  
Author(s):  
Sridevi Nair ◽  
Manpreet Kaur ◽  
Ramkishor Sah ◽  
Jeewan S Titiyal
Keyword(s):  
Dry Eye ◽  
Ocular Surface ◽  
Surface Stability ◽  
Eye Symptoms ◽  
Mask Edge ◽  
Dry Eye Symptoms

Score-based mask edge improvement of Mask-RCNN for segmentation of fruit and vegetables

2021 ◽  
pp. 116205
Author(s):  
Khurram Hameed ◽  
Douglas Chai ◽  
Alexander Rassau
Keyword(s):  
Fruit And Vegetables ◽  
Mask Edge

Dark Field Sensitivity In Single Mask Edge Illumination Lung Imaging

2021 ◽  
Author(s):  
Jonathan Sanctorum ◽  
Jan Sijbers ◽  
Jan De Beenhouwer
Keyword(s):  
Dark Field ◽  
Lung Imaging ◽  
Field Sensitivity ◽  
Mask Edge

scholarly journals Comparing signal intensity and refraction sensitivity of double and single mask edge illumination lab-based x-ray phase contrast imaging set-ups

2017 ◽  
Vol 50 (41) ◽  
pp. 415401 ◽  
Author(s):  
G K Kallon ◽  
P C Diemoz ◽  
F A Vittoria ◽  
D Basta ◽  
M Endrizzi ◽  
...  
Keyword(s):  
Signal Intensity ◽  
Phase Contrast ◽  
Phase Contrast Imaging ◽  
Contrast Imaging ◽  
X Ray ◽  
Mask Edge

Characterizing the dependence of thick-mask edge effects on illumination angle using AIMS images

2015 ◽  
Author(s):  
Aamod Shanker ◽  
Martin Sczyrba ◽  
Falk Lange ◽  
Brid Connolly ◽  
Andy Neureuther ◽  
...  
Keyword(s):  
Edge Effects ◽  
Mask Edge

Optimization of electron beam patterned hydrogen silsesquioxane mask edge roughness for low-loss silicon waveguides

2014 ◽  
Vol 8 (1) ◽  
pp. 083098 ◽  
Author(s):  
Michael G. Wood ◽  
Li Chen ◽  
Justin R. Burr ◽  
Ronald M. Reano
Keyword(s):  
Electron Beam ◽  
Hydrogen Silsesquioxane ◽  
Low Loss ◽  
Silicon Waveguides ◽  
Edge Roughness ◽  
Mask Edge

CBIR using KEVR vector quantization applied on gradient mask edge images

2013 ◽  
Author(s):  
H. B. Kekre ◽  
S. D. Thepade ◽  
S. P. Sanas ◽  
S. Iyer ◽  
J. Garg
Keyword(s):  
Vector Quantization ◽  
Mask Edge

Modeling of through-focus aerial image with aberration and imaginary mask edge effects in optical lithography simulation

2011 ◽  
Vol 50 (20) ◽  
pp. 3570 ◽  
Author(s):  
Kenji Yamazoe ◽  
Andrew R. Neureuther
Keyword(s):  
Edge Effects ◽  
Optical Lithography ◽  
Aerial Image ◽  
Lithography Simulation ◽  
Mask Edge
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