Effect of F on B penetration through gate oxide for BF/sub 2/ implants used to obtain ultra-shallow junctions by RTA

Author(s):  
A. Sultan ◽  
M. Craig ◽  
S. Banejee ◽  
S. List ◽  
T. Grider ◽  
...  
2011 ◽  
Author(s):  
G. D. Papasouliotis ◽  
L. Godet ◽  
V. Singh ◽  
R. Miura ◽  
H. Ito ◽  
...  

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R. Lindsay ◽  
K. Henson ◽  
W. Vandervorst ◽  
K. Maex ◽  
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2013 ◽  
Vol 2 (5) ◽  
pp. P195-P204 ◽  
Author(s):  
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Masashi Okutani ◽  
Gota Murai ◽  
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1991 ◽  
Vol 20 (3) ◽  
pp. 261-265 ◽  
Author(s):  
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Shubneesh Batra ◽  
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Gayle Lux

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