Advanced gate stack work function optimization and substrate dependent strain interactions on HKMG first stacks for 28nm VLSI ultra low power technologies

Author(s):  
J. Hoentschel ◽  
Shiang Yang Ong ◽  
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pp. 13176-13183 ◽  
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Nano Letters ◽  
2013 ◽  
Vol 13 (4) ◽  
pp. 1451-1456 ◽  
Author(s):  
T. Barois ◽  
A. Ayari ◽  
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...  

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