Advanced gate stack work function optimization and substrate dependent strain interactions on HKMG first stacks for 28nm VLSI ultra low power technologies
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2019 ◽
Vol 25
(57)
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pp. 13176-13183
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2016 ◽
Vol 136
(11)
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pp. 1555-1566
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2010 ◽
Vol 24
(10)
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pp. 979-984
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2010 ◽
2013 ◽
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