Extreme ultraviolet alignment and testing of a four-mirror ring field extreme ultraviolet optical system

2000 ◽  
Vol 18 (6) ◽  
pp. 2911 ◽  
Author(s):  
Kenneth A. Goldberg ◽  
Patrick Naulleau ◽  
Phillip Batson ◽  
Paul Denham ◽  
Erik H. Anderson ◽  
...  
Keyword(s):  
Optical System ◽  
Extreme Ultraviolet

All-reflective optical system design for extreme ultraviolet lithography

2010 ◽  
Vol 8 (11) ◽  
pp. 1082-1084 ◽  
Author(s):  
常军 Jun Chang ◽  
邹美芳 Meifang Zou ◽  
王蕊瑞 Ruirui Wang ◽  
冯树龙 Shulong Feng ◽  
M.M.Talha M. M. Talha
Keyword(s):  
System Design ◽  
Optical System ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Optical System Design ◽  
Ultraviolet Lithography

scholarly journals Electro-optical system for scanning microscopy of extreme ultraviolet masks with a high harmonic generation source

2014 ◽  
Vol 22 (17) ◽  
pp. 20144 ◽  
Author(s):  
Patrick P. Naulleau ◽  
Christopher N. Anderson ◽  
Erik H. Anderson ◽  
Nord Andreson ◽  
Weilun Chao ◽  
...  
Keyword(s):  
Harmonic Generation ◽  
Optical System ◽  
Extreme Ultraviolet ◽  
High Harmonic ◽  
High Harmonic Generation ◽  
Scanning Microscopy

Optimization of Optical System of Extreme UltraViolet Spectrometer

2010 ◽  
Vol 30 (9) ◽  
pp. 2646-2651
Author(s):  
徐挺 Xu Ting ◽  
吕丽军 LV Lijun
Keyword(s):  
Optical System ◽  
Extreme Ultraviolet ◽  
Ultraviolet Spectrometer

A Field Emission System For Transmission Electron Microscopy

1973 ◽  
Vol 31 ◽  
pp. 298-299
Author(s):  
Michel Troyonal ◽  
Huei Pei Kuoal ◽  
Benjamin M. Siegelal
Keyword(s):  
Electron Microscope ◽  
Field Emission ◽  
Optical System ◽  
High Vacuum ◽  
Ultra High Vacuum ◽  
Objective Lens ◽  
Electron Optical System ◽  
Cross Sectional ◽  
Transmission Electron ◽  
Emission System

A field emission system for our experimental ultra high vacuum electron microscope has been designed, constructed and tested. The electron optical system is based on the prototype whose performance has already been reported. A cross-sectional schematic illustrating the field emission source, preaccelerator lens and accelerator is given in Fig. 1. This field emission system is designed to be used with an electron microscope operated at 100-150kV in the conventional transmission mode. The electron optical system used to control the imaging of the field emission beam on the specimen consists of a weak condenser lens and the pre-field of a strong objective lens. The pre-accelerator lens is an einzel lens and is operated together with the accelerator in the constant angular magnification mode (CAM).

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