Etching of polysilicon in inductively coupled Cl[sub 2] and HBr discharges. II. Simulation of profile evolution using cellular representation of feature composition and Monte Carlo computation of flux and surface kinetics

Author(s):  
Arpan P. Mahorowala ◽  
Herbert H. Sawin
2009 ◽  
Vol 36 (6Part15) ◽  
pp. 2612-2612
Author(s):  
D Mirkovic ◽  
U Titt ◽  
G Sawakuchi ◽  
X Zhang ◽  
Y Li ◽  
...  

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