Environmental stability of 193 nm single layer chemically amplified resists

1999 ◽  
Vol 17 (1) ◽  
pp. 101 ◽  
Author(s):  
A. G. Timko ◽  
F. M. Houlihan ◽  
R. A. Cirelli ◽  
O. Nalamasu ◽  
Hiroshi Yoshino ◽  
...  
Keyword(s):  
Single Layer ◽  
Environmental Stability ◽  
Chemically Amplified ◽  
Chemically Amplified Resists ◽  
193 Nm

Refractive index change during exposure for 193-nm chemically amplified resists

1999 ◽  
Author(s):  
Hye-Keun Oh ◽  
Young-Soo Sohn ◽  
Moon-Gyu Sung ◽  
Young-Mi Lee ◽  
Eun-Mi Lee ◽  
...  
Keyword(s):  
Refractive Index ◽  
Refractive Index Change ◽  
Index Change ◽  
Chemically Amplified ◽  
Chemically Amplified Resists ◽  
193 Nm

Acid amplification of chemically amplified resists for 193-nm lithography

1997 ◽  
Author(s):  
Takeshi Ohfuji ◽  
Makoto Takahashi ◽  
Koichi Kuhara ◽  
Tohru Ogawa ◽  
Hiroshi Ohtsuka ◽  
...  
Keyword(s):  
Chemically Amplified ◽  
Chemically Amplified Resists ◽  
193 Nm

Non-chemically amplified resists for 193 nm lithography

2008 ◽  
Author(s):  
Isao Nishimura ◽  
William H. Heath ◽  
Kazuya Matsumoto ◽  
Wei-Lun Jen ◽  
Saul S. Lee ◽  
...  
Keyword(s):  
Chemically Amplified ◽  
Chemically Amplified Resists ◽  
193 Nm

scholarly journals Characterization of Chemically Amplified Resists with "Acid Amplifier" for 193 nm Lithography.

1997 ◽  
Vol 10 (4) ◽  
pp. 551-558 ◽  
Author(s):  
Takeshi Ohfuji ◽  
Makoto Takahashi ◽  
Masaru Sasago ◽  
Soh Noguchi ◽  
Kunihiro Ichimura
Keyword(s):  
Chemically Amplified ◽  
Chemically Amplified Resists ◽  
193 Nm ◽  
Acid Amplifier

Modeling chemically amplified resists for 193-nm lithography

2000 ◽  
Author(s):  
Ebo H. Croffie ◽  
Mosong Cheng ◽  
Andrew R. Neureuther ◽  
Francis M. Houlihan ◽  
Raymond A. Cirelli ◽  
...  
Keyword(s):  
Chemically Amplified ◽  
Chemically Amplified Resists ◽  
193 Nm

scholarly journals Non-chemically amplified resists for 193-nm immersion lithography: influence of absorbance on performance

2010 ◽  
Author(s):  
Lan Chen ◽  
Yong-Keng Goh ◽  
Kirsten Lawrie ◽  
Bruce Smith ◽  
Warren Montgomery ◽  
...  
Keyword(s):  
Immersion Lithography ◽  
Chemically Amplified ◽  
Chemically Amplified Resists ◽  
193 Nm

Dissolution Inhibitors for 193-nm Chemically Amplified Resists

1997 ◽  
Vol 36 (Part 1, No. 12B) ◽  
pp. 7625-7631
Author(s):  
Tohru Ushirogouchi ◽  
Koji Asakawa ◽  
Takeshi Okino ◽  
Naomi Shida ◽  
Naoko Kihara ◽  
...  
Keyword(s):  
Chemically Amplified ◽  
Chemically Amplified Resists ◽  
193 Nm

Investigation of environmental stability in chemically amplified resists

1997 ◽  
Vol 35 (1-4) ◽  
pp. 153-156 ◽  
Author(s):  
H. Yoshino ◽  
T. Itani ◽  
S. Hashimoto ◽  
M. Yamana ◽  
N. Samoto ◽  
...  
Keyword(s):  
Environmental Stability ◽  
Chemically Amplified ◽  
Chemically Amplified Resists

Novel single-layer chemically amplified resist for 193-nm lithography

1997 ◽  
Author(s):  
Sang-Jun Choi ◽  
Yool Kang ◽  
Dong-Won Jung ◽  
Chun-Geun Park ◽  
Joo-Tae Moon
Keyword(s):  
Single Layer ◽  
Chemically Amplified ◽  
Chemically Amplified Resist ◽  
193 Nm
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