Perspectives and tradeoffs of absorber materials for high NA EUV lithography
Andreas Erdmann
◽
Hazem Mesilhy
◽
Peter Evanschitzky
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Vicky Philipsen
◽
Frank Timmermans
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...
2008 ◽
Vol 128
(10)
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pp. 668-668
Bjoern A. M. Hansson
◽
Lars Rymell
◽
Magnus Berglund
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Oscar E. Hemberg
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Emmanuelle Janin
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...
2007 ◽
Vol 111
(33)
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pp. 12165-12168
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David J. Davis
◽
Georgios Kyriakou
◽
Robert B. Grant
◽
Mintcho S. Tikhov
◽
Richard M. Lambert
Takeo Watanabe
◽
Hiroo Kinoshita
◽
Atsushi Miyafuji
◽
Shigeo Irie
◽
Shigeru Shirayone
◽
...
Yuelin Du
◽
Hongbo Zhang
◽
Martin D. F. Wong
◽
Yunfei Deng
◽
Rasit O. Topaloglu
Masatoshi Echigo
◽
Dai Oguro
Junichi Fujimoto
◽
Tsukasa Hori
◽
Tatsuya Yanagida
◽
Takeshi Ohta
◽
Yasufumi Kawasuji
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...