plasma source
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2022 ◽  
Vol 131 (1) ◽  
pp. 013302
Author(s):  
Andrea Lucca Fabris ◽  
Christopher V. Young ◽  
Aaron Knoll ◽  
Emmanuelle K. Rosati Azevedo ◽  
Mark A. Cappelli

Author(s):  
Lisa Buschmann ◽  
Ashild Fredriksen

Abstract The information about the electron population of a helicon source plasma that expands along a magnetic nozzle is important for understanding the plasma acceleration across the potential drop that forms in the nozzle. The electrons need an energy higher than the potential drop to escape from the source. At these energies the signal of a Langmuir probe is less accurate. An inverted RFEA measures the high-energy tail of the electrons. To reach the probe, they must have energies above the plasma potential VP, which can vary over the region of the measurement. By constructing a full distribution by applying the electron temperature Te obtained from the electron IV-curve and the VP obtained from the ion collecting RFEA or an emissive probe, a density measure of the hot electron distribution independent of VP can be obtained. The variation of the high-energy tail of the EEDF in both radial and axial directions, in the two different cases of 1) a purely expanding magnetic field nozzle, and 2) a more constricted one by applying current in a third, downstream coil was investigated. The electron densities and temperatures from the source are then compared to two analytic models of the downstream development of the electron density. The first model considers the development for a pure Boltzmann distribution while the second model takes an additional magnetic field expansion into account. A good match between the measured densities and the second model was found for both configurations. The RFEA probe also allows for directional measurement of the electron current to the probe. This property is used to compare the densities from the downstream and upstream directions, showing a much lower contribution of downstream electrons into the source for a purely expanding magnetic field in comparison to the confined magnetic field configuration.


Author(s):  
Steffen Pauly ◽  
Andreas Schulz ◽  
Matthias Walker ◽  
Moritz Gorath ◽  
Klaus Baumgärtner ◽  
...  

Author(s):  
Dirk Hegemann ◽  
Sandra Gaiser

Abstract Manmade soft materials are important in a wide range of technological applications and play a key role in the development of future technologies, mainly at the interface of synthetic and biological components. They include gels and hydrogels, elastomers, structural and packaging materials, micro and nanoparticles as well as biological materials. Soft materials can be distinguished from liquids owing to their defined shape and from hard materials by the deformability of their shape. This review article provides an overview of recent progress on the plasma engineering and processing of softer materials, especially in the area of synthesis, surface modification, etching, and deposition. The article aims to demonstrate the extensive range of plasma surface engineering as used to form, modify, and coat soft materials focusing on material properties and potential applications. In general, the plasma provides highly energetic, non-equilibrium conditions at material surfaces requiring to adjust the conditions for plasma-surface interaction to account for the specifics of soft matter, which holds independent of the used plasma source. Plasma-induced crosslinking and polymerization of liquids is discussed to transform them into gel-like materials as well as to modify the surface region of viscous liquids. A major field covers the plasma surface engineering of manmade soft materials with the help of gaseous reactive species yielding ablation, nanostructuring, functionalization, crosslinking, stiffening, and/or deposition to obtain demanded surface properties or adhesion to dissimilar materials. Finally, plasma engineering of rigid materials is considered to induce surface softening for the enhanced contact with tissues, to allow interaction in aqueous media, and to support bonding to soft matter. The potential and future perspectives of plasma engineering will be discussed in this review to contribute to a higher knowledge of plasma interaction with sensitive materials such as soft matter.


Metals ◽  
2021 ◽  
Vol 11 (12) ◽  
pp. 2032
Author(s):  
Alexandre Rondepierre ◽  
Arnaud Sollier ◽  
Laurent Videau ◽  
Laurent Berthe

This review proposes to summarize the development of laser shock applications in a confined regime, mainly laser shock peening, over the past 50 years since its discovery. We especially focus on the relative importance of the source term, which is directly linked to plasma pressure. Discussions are conducted regarding the experimental setups, experimental results, models and numerical simulations. Confined plasmas are described and their specific properties are compared with those of well-known plasmas. Some comprehensive keys are provided to help understand the behavior of these confined plasmas during their interaction with laser light to reach very high pressures that are fundamental for laser shock applications. Breakdown phenomena, which limit pressure generation, are also presented and discussed. A historical review was conducted on experimental data, such as pressure, temperature, and density. Available experimental setups used to characterize the plasma pressure are also discussed, and improvements in metrology developed in recent years are presented. Furthermore, analytical and numerical models based on these experiments and their improvements, are also reviewed, and the case of aluminum alloys is studied through multiple works. Finally, this review outlines necessary future improvements that expected by the laser shock community to improve the estimation of the source term.


2021 ◽  
Vol 16 (12) ◽  
pp. C12019
Author(s):  
G. Marcer ◽  
M. Nocente ◽  
L. Giacomelli ◽  
G. Gorini ◽  
E. Perelli Cippo ◽  
...  

Abstract The fusion power produced in a DT thermonuclear reactor is currently determined by measuring the absolute 14 MeV neutron yield of the D(T, α)n fusion reaction. Measurements of 17 MeV gamma rays born from the much less probable D(T, 5He)γ reaction (branching ratio of ∼10−5) have been proposed as an alternative independent method to validate the neutron counting method and also to fulfill the requests of the nuclear regulator for licensing ITER DT operations. However, the development of absolute 17 MeV gamma ray emission measurements entails a number of requirements, such as: (i) knowledge of the 17 MeV gamma ray to 14 MeV neutron emission branching ratio; (ii) the simulation of the gamma ray transport from the extended plasma source to the gamma ray detectors; (iii) a careful determination of the absolute efficiency of previously calibrated gamma ray spectrometers. In this work, we have studied the possibility to infer the global gamma ray emission rate from measurements made with a 3″ × 6″ LaBr3 spectrometer installed at the end of a collimated tangential line of sight at the JET tokamak and using the neutron emission from deuterium plasmas of the most recent experimental campaigns. Results show that 17 MeV gamma ray fluxes at the end of this tangential line of sight have a weak dependence (less than 5%) on the plasma profile and can therefore be used to infer the total emission from the plasma.


2021 ◽  
Vol 39 (6) ◽  
pp. 062403
Author(s):  
Harm C. M. Knoops ◽  
Karsten Arts ◽  
Jan W. Buiter ◽  
Luca Matteo Martini ◽  
Richard Engeln ◽  
...  

2021 ◽  
Vol 2086 (1) ◽  
pp. 012033
Author(s):  
A A Rezvan ◽  
J V Morozova ◽  
V S Klimin

Abstract This paper presents a study of the use of silicon Si for element base manufacture of micro- and nanoelectronics by using combined methods of focused ion beams and atomic layer plasma chemical etching. This technology makes it possible to modify surface of Si substrates in the required topology and geometry, followed by removal of atoms to obtain nanoscale elements. The influence of parameters of method of focused ion beams and plasma chemical etching on parameters of the formed structures is analyzed. So, for example, for formation of structures with maximum roughness, it is necessary to increase values of parameters responsible for reactive ion etching, these are such parameters as: the power of capacitive plasma source, the mixing voltage, and the flow rate of an inert gas (argon).


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